接觸型局域SP光刻直寫頭變形檢測(cè)技術(shù)研究
發(fā)布時(shí)間：2018-11-23 12:37
【摘要】：光學(xué)光刻技術(shù)發(fā)展至今已有幾十年的時(shí)間,并為“摩爾定律”的延續(xù)作出了重大貢獻(xiàn)。但是光學(xué)光刻最終會(huì)因?yàn)檫_(dá)到技術(shù)極限或者是由于光刻成本劇增而被放棄。所以人們一直努力尋求能提高光刻分辨率,具有高效率、低成本的新方法和技術(shù)。其中,基于接觸型表面等離子體光刻直寫技術(shù)因其成本低廉、快捷靈活等特點(diǎn),特別適合于小批、單件納米圖形制作需求,具有很好的開(kāi)發(fā)價(jià)值。本課題來(lái)源于國(guó)家重點(diǎn)實(shí)驗(yàn)室開(kāi)放基金“接觸型局域SP光刻直寫頭設(shè)計(jì)和掃描性能分析研究”。根據(jù)課題要求,需要設(shè)計(jì)一種可行的檢測(cè)方案對(duì)光刻直寫過(guò)程中的直寫頭微變形情況進(jìn)行檢測(cè),為進(jìn)一步研究如何控制直寫頭的掃描姿態(tài)做準(zhǔn)備。第二章首先介紹了直寫頭的結(jié)構(gòu)及光刻直寫過(guò)程,在課題組仿真分析的基礎(chǔ)上,進(jìn)一步研究了不同摩擦因數(shù)、位移載荷、掃描速度等外界因素對(duì)掃描模式下的直寫頭姿態(tài)偏轉(zhuǎn)的影響。最后提出直寫頭姿態(tài)偏轉(zhuǎn)角為具體的檢測(cè)目標(biāo)。第三章分別對(duì)電容法和光束偏轉(zhuǎn)法兩種檢測(cè)思路進(jìn)行了具體的可行性分析。特別是對(duì)基于光束偏轉(zhuǎn)法直寫頭姿態(tài)偏轉(zhuǎn)檢測(cè)進(jìn)行了數(shù)學(xué)模型建立和數(shù)值仿真分析,通過(guò)比較并選擇了光束偏轉(zhuǎn)法作為檢測(cè)方案。第四章對(duì)已選擇的方法進(jìn)行了總體檢測(cè)方案設(shè)計(jì),然后分析并確定了光源、光電探測(cè)模塊的種類。依據(jù)課題中對(duì)測(cè)量范圍、測(cè)量分辨率的要求完成光路結(jié)構(gòu)設(shè)計(jì)、He-Ne激光器的選擇和光斑計(jì)算、PSD的參數(shù)計(jì)算和選型。第五章基于LabVIEW和數(shù)據(jù)采集卡USB6008,對(duì)PSD輸出信號(hào)數(shù)據(jù)采集模塊進(jìn)行軟件設(shè)計(jì),編寫了LabVIEW數(shù)據(jù)采集處理程序,用于后續(xù)的系統(tǒng)標(biāo)定、穩(wěn)定性、背景光影響等測(cè)試實(shí)驗(yàn)。最后簡(jiǎn)要介紹了搭建的實(shí)驗(yàn)平臺(tái),分析總結(jié)影響實(shí)驗(yàn)精度的幾種因素,并提出了相應(yīng)的改進(jìn)措施。
[Abstract]:Optical lithography has been developed for decades and has contributed greatly to the continuation of Moore's Law. But optical lithography will eventually be abandoned because it reaches the technical limit or because of the soaring cost of lithography. So people have been looking for new methods and technologies that can improve lithography resolution and have high efficiency and low cost. Because of its low cost, high speed and flexibility, the direct writing technology based on contact surface plasma lithography is especially suitable for small batch, single piece nano-graphics production, and has a good development value. This paper is based on the National key Laboratory Open Fund, "Design of contact Local SP Lithography Direct Writing head and Analysis of scanning performance". According to the requirements of the project, we need to design a feasible detection scheme to detect the micro-deformation of the direct-writing head in the process of lithography, so as to prepare for further research on how to control the scanning attitude of the direct-writing head. In the second chapter, the structure of the direct-writing head and the process of lithography are introduced. On the basis of the simulation analysis of the research group, the different friction factors and displacement loads are further studied. The influence of external factors such as scanning speed on direct-write head posture deflection in scan mode. Finally, the pose deflection angle of direct writing head is proposed as the specific detection target. In chapter 3, the feasibility of capacitance method and beam deflection method are analyzed. In particular, the mathematical model and numerical simulation analysis of the direct-writing head attitude deflection detection based on the beam deflection method are carried out, and the beam deflection method is selected as the detection scheme through comparison. In the fourth chapter, the overall detection scheme is designed, and the light source and photoelectric detection module are analyzed and determined. According to the requirements of measurement range and resolution, the design of optical circuit structure, the selection of He-Ne laser and spot calculation, the calculation and selection of PSD parameters are completed. In the fifth chapter, based on LabVIEW and data acquisition card USB6008, the software design of PSD output signal data acquisition module is carried out, and the LabVIEW data acquisition and processing program is compiled for subsequent system calibration, stability and background light impact testing experiments. Finally, the experimental platform is introduced briefly, several factors influencing the precision of the experiment are analyzed and summarized, and the corresponding improvement measures are put forward.
【學(xué)位授予單位】：電子科技大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TN305.7
[Abstract]:Optical lithography has been developed for decades and has contributed greatly to the continuation of Moore's Law. But optical lithography will eventually be abandoned because it reaches the technical limit or because of the soaring cost of lithography. So people have been looking for new methods and technologies that can improve lithography resolution and have high efficiency and low cost. Because of its low cost, high speed and flexibility, the direct writing technology based on contact surface plasma lithography is especially suitable for small batch, single piece nano-graphics production, and has a good development value. This paper is based on the National key Laboratory Open Fund, "Design of contact Local SP Lithography Direct Writing head and Analysis of scanning performance". According to the requirements of the project, we need to design a feasible detection scheme to detect the micro-deformation of the direct-writing head in the process of lithography, so as to prepare for further research on how to control the scanning attitude of the direct-writing head. In the second chapter, the structure of the direct-writing head and the process of lithography are introduced. On the basis of the simulation analysis of the research group, the different friction factors and displacement loads are further studied. The influence of external factors such as scanning speed on direct-write head posture deflection in scan mode. Finally, the pose deflection angle of direct writing head is proposed as the specific detection target. In chapter 3, the feasibility of capacitance method and beam deflection method are analyzed. In particular, the mathematical model and numerical simulation analysis of the direct-writing head attitude deflection detection based on the beam deflection method are carried out, and the beam deflection method is selected as the detection scheme through comparison. In the fourth chapter, the overall detection scheme is designed, and the light source and photoelectric detection module are analyzed and determined. According to the requirements of measurement range and resolution, the design of optical circuit structure, the selection of He-Ne laser and spot calculation, the calculation and selection of PSD parameters are completed. In the fifth chapter, based on LabVIEW and data acquisition card USB6008, the software design of PSD output signal data acquisition module is carried out, and the LabVIEW data acquisition and processing program is compiled for subsequent system calibration, stability and background light impact testing experiments. Finally, the experimental platform is introduced briefly, several factors influencing the precision of the experiment are analyzed and summarized, and the corresponding improvement measures are put forward.
【學(xué)位授予單位】：電子科技大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TN305.7
【參考文獻(xiàn)】
相關(guān)期刊論文 前2條
1 張攀峰;吳宇;劉曉e，
本文編號(hào)：2351643
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