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深紫外光刻投影物鏡溫度特性研究

發(fā)布時間:2018-10-29 19:15
【摘要】:透鏡材料對激光能量的吸收導(dǎo)致深紫外光刻投影物鏡溫度升高,產(chǎn)生熱像差。離軸照明模式下,溫度呈非對稱分布,研究溫度場對熱像差的仿真預(yù)測和補償具有十分重要的意義。提出了溫度分布函數(shù)模型描述4種照明模式下物鏡的三維溫度分布;研究了溫度的時間特性,并通過計算預(yù)測了光刻物鏡的熱穩(wěn)態(tài)溫度值以及達到穩(wěn)態(tài)所需的時間。結(jié)果表明,利用該溫度分布模型描述多種常見照明模式下投影物鏡的空間溫度分布,平均擬合誤差約為10-3℃量級;通過溫度時間關(guān)系函數(shù)預(yù)測熱穩(wěn)態(tài)溫度的誤差約為10-4℃,時間誤差不超過3min。通過該溫度分布模型計算得到的熱像差結(jié)果與基于SigFit的仿真結(jié)果一致,但計算效率提升了三個數(shù)量級。
[Abstract]:The absorption of laser energy by lens materials leads to the increase of temperature and thermal aberration of deep ultraviolet lithography projection lens. In off-axis illumination mode, the temperature distribution is asymmetric, so it is very important to study the simulation prediction and compensation of thermal aberration. The temperature distribution function model is proposed to describe the three-dimensional temperature distribution of the objective lens in four illumination modes, and the time characteristics of the temperature are studied, and the thermal steady-state temperature value of the lithographic objective lens and the time required to achieve the steady-state are calculated and predicted. The results show that the average fitting error is about 10 ~ (-3) 鈩,

本文編號:2298557

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