【摘要】：基于孔陣列的金屬網(wǎng)格各單元之間相互耦合,金屬中自由電子與入射電磁波發(fā)生共振,形成增強(qiáng)透射,共振波長(zhǎng)由結(jié)構(gòu)尺寸決定,因此基于孔陣列的金屬網(wǎng)格結(jié)構(gòu)常常作為帶通濾波器。但金屬網(wǎng)格在帶外短波長(zhǎng)區(qū)域存在旁瓣,嚴(yán)重影響濾波性能。旁瓣主要是由衍射、F-P共振和高階共振三種因素造成的。本文設(shè)計(jì)了一種基于十字孔陣列結(jié)構(gòu)的改進(jìn)結(jié)構(gòu),來改善旁瓣問題。本論文主要工作包括以下兩點(diǎn)。(1)設(shè)計(jì)了基于折疊十字孔陣列的金屬網(wǎng)格帶通濾波器。結(jié)合已有的相關(guān)理論,包括表面等離子激元理論、等效表面等離子激元、Wood異常、F-P腔原理、波導(dǎo)效應(yīng)等,通過有限元仿真,發(fā)現(xiàn)短波區(qū)域旁瓣是由衍射、高階共振峰、F-P共振峰組成,高階共振的波長(zhǎng)與主共振的波長(zhǎng)是相對(duì)固定的,F-P共振峰的位置與網(wǎng)格厚度有關(guān),衍射區(qū)域是波長(zhǎng)小于周期的區(qū)域。折疊十字孔陣列主要是利用其緊湊的結(jié)構(gòu),使主共振峰與衍射區(qū)域盡量遠(yuǎn)離,實(shí)現(xiàn)在更大范圍內(nèi)良好的帶外抑制。(2)對(duì)無基底金屬網(wǎng)格帶通濾波器的加工工藝進(jìn)行研究。研究了其加工流程,并研制了二維周期結(jié)構(gòu)的無掩模光刻系統(tǒng),包括兩個(gè)部分：1、設(shè)計(jì)并搭建了基于DMD投影成像的無掩模光刻系統(tǒng)的光路系統(tǒng)：2、研發(fā)了用于二維陣列掃描光刻的控制系統(tǒng)。采用SU-82010光刻膠和研制的光刻系統(tǒng),按照相應(yīng)流程,進(jìn)行了光刻實(shí)驗(yàn),然后通過電鍍鎳,成功制作了小規(guī)模陣列無基底金屬網(wǎng)格結(jié)構(gòu)。
[Abstract]:The metal mesh elements based on the aperture array are coupled with each other, and the free electron in the metal resonates with the incident electromagnetic wave, forming an enhanced transmission. The resonant wavelength is determined by the size of the structure. Therefore, metal mesh structures based on aperture arrays are often used as bandpass filters. However, the metal mesh has sidelobe in the short wavelength region outside the band, which seriously affects the filtering performance. The sidelobe is mainly caused by diffraction, F-P resonance and high order resonance. In this paper, an improved structure based on cross-hole array is designed to improve the sidelobe problem. The main work of this thesis is as follows: (1) A metal mesh bandpass filter based on folded cross hole array is designed. Combined with the existing theories, including surface plasmon theory, equivalent surface plasmon theory, Wood anomaly, F-P cavity principle, waveguide effect and so on, it is found that the short wave region sidelobe is diffracted by finite element simulation. The high order resonance peak, the F-P resonance peak, the high order resonance wavelength and the main resonance wavelength are relatively fixed, the position of the F-P resonance peak is related to the mesh thickness, and the diffraction region is the region where the wavelength is less than the period. The folded cross hole array mainly uses its compact structure to make the main resonance peak and diffraction region as far away as possible and to achieve better out-of-band suppression in a larger range. (2) the fabrication process of the substrate-free metal mesh bandpass filter is studied. The machining process is studied, and the mask free lithography system with two dimensional periodic structure is developed. There are two parts: 1. The optical path system of the mask free lithography system based on DMD projection imaging is designed and built. 2. A control system for two-dimensional array scanning lithography is developed. By using SU-82010 photoresist and the developed lithography system, lithography experiments were carried out according to the corresponding flow chart, and then the substrate free metal mesh structure of small scale array was successfully fabricated by electroplating nickel.
【學(xué)位授予單位】：東南大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TN713.5

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本文編號(hào)：2290224