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不同pH值下過(guò)氧化氫對(duì)Ru的CMP的影響

發(fā)布時(shí)間:2018-10-22 20:13
【摘要】:研究了以H_2O_2為氧化劑,不同的pH值(2,4,6,8,10)對(duì)Ru的去除速率(vRu)和靜態(tài)腐蝕速率(vSER)的影響,同時(shí)用電化學(xué)的方法研究了H_2O_2和pH值對(duì)Ru表面的動(dòng)態(tài)極化曲線的影響,利用原子力顯微鏡對(duì)每次拋光前后的微觀形貌進(jìn)行了觀察。實(shí)驗(yàn)結(jié)果表明:隨著pH值的逐漸增大,Ru的去除速率和靜態(tài)腐蝕速率也會(huì)隨之升高,堿性條件下的vRu和vSER明顯高于酸性條件。當(dāng)pH值為2時(shí),Ru表面生成致密的鈍化層,阻礙了化學(xué)作用,vRu(0.31 nm/min)和vSER(0nm/min)最低;當(dāng)pH值為4和6時(shí),會(huì)生成可溶性的RuO_4,提高了化學(xué)作用,vRu和vSER相對(duì)提高;當(dāng)pH值為8和10時(shí),生成RuO_4~(2-)和RuO_4~-化學(xué)作用明顯,vRu和vSER顯著提高;當(dāng)pH值為10時(shí),vRu(23.544 nm/min)和vSER(2.88 nm/min)最高。同時(shí),隨著pH值的逐漸增大,Ru表面的腐蝕電位(Ecorr)不斷減小,腐蝕電流密度(Icorr)不斷增大,當(dāng)pH值為10時(shí),Ecorr達(dá)到最低值(0.094 V),Icorr為最高值(1.37×10~(-3)A/cm~(-2))。
[Abstract]:The effects of different pH values (2 ~ 4 ~ 6 ~ (6 ~ 8 ~ 10) on the removal rate of Ru (vRu) and static corrosion rate (vSER) were studied by using H_2O_2 as oxidant. The effects of H_2O_2 and pH values on the dynamic polarization curves of Ru surface were also studied by electrochemical method. Atomic force microscope (AFM) was used to observe the morphology of each polishing. The experimental results show that the removal rate and static corrosion rate of Ru increase with the increase of pH value. The vRu and vSER in alkaline condition are obviously higher than those in acidic condition. When pH value is 2, dense passivating layer is formed on the surface of Ru, which hinders the chemical action of, vRu (0.31 nm/min) and vSER (0nm/min) lowest, when pH value is 4 and 6, soluble RuO_4, increases chemically, vRu and vSER increase relatively, and when pH value is 8 and 10:00, The chemical effects of RuO_4~ (2-) and RuO_4~- were obvious, vRu and vSER were significantly increased, and when pH was 10:00, vRu (23.544 nm/min) and vSER (2.88 nm/min) were the highest. At the same time, with the increase of pH value, the corrosion potential (Ecorr) of Ru surface decreases and the corrosion current density (Icorr) increases. When pH value is 10:00, Ecorr reaches the lowest value (0.094 V), Icorr is the highest value (1.37 脳 10 ~ (-3) A / cm ~ (-2).
【作者單位】: 河北工業(yè)大學(xué)電子信息工程學(xué)院;天津市電子材料與器件重點(diǎn)實(shí)驗(yàn)室;
【基金】:國(guó)家中長(zhǎng)期科技發(fā)展規(guī)劃02科技重大專項(xiàng)資助項(xiàng)目(2016ZX02301003-004-007) 國(guó)家科技重大專項(xiàng)子課題河北省青年自然科學(xué)基金資助項(xiàng)目(F2015202267) 河北省教育廳基金資助項(xiàng)目(QN2014208) 河北省自然科學(xué)基金資助項(xiàng)目(E2013202247) 河北工業(yè)大學(xué)優(yōu)秀青年科技創(chuàng)新基金資助項(xiàng)目(2015007)
【分類(lèi)號(hào)】:TN305.2


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