【摘要】：到目前為止微波電子學(xué)已經(jīng)經(jīng)過百余年的發(fā)展,現(xiàn)在已經(jīng)建立起了比較完整的理論體系,這使得微波電真空器件成為了現(xiàn)代科技發(fā)展的重要組成部分。電子槍作為微波電真空器件的重要組成部分,同時(shí)也是微波電真空器件的心臟,它的設(shè)計(jì)對(duì)整個(gè)器件的各個(gè)參數(shù)有著決定性作用。隨著技術(shù)的不斷發(fā)展,由最初的皮爾斯電子槍,到現(xiàn)在多種多樣的新型電子槍,各種電子槍層出不窮,以滿足更高頻率,更高效率,更高增益,小型化,響應(yīng)時(shí)間短等要求。多注電子槍和帶狀注電子槍應(yīng)運(yùn)而生,多電子注技術(shù)能有效降低工作電壓,同時(shí)多電子注電子槍在比較低的工作電壓下的功率比單電子注電子槍的功率更高,作為新型的電子槍多注電子槍是研究熱點(diǎn),它的設(shè)計(jì)顯得尤為重要。本論文研究的是平行電子注的產(chǎn)生和控制電子注傳輸?shù)木劢瓜到y(tǒng),聚焦系統(tǒng)的主要作用是平衡電子注的空間電荷力,以維持電子注保持一定形狀,以避免電子注被高頻結(jié)構(gòu)截獲,保證其良好的流通性。首先分析了強(qiáng)流電子光學(xué)系統(tǒng)的基本原理和強(qiáng)流電子槍的重要參數(shù),然后對(duì)平行多注電子槍進(jìn)行設(shè)計(jì)和仿真。通過需求分析確定電子槍各個(gè)參數(shù),然后在CST中進(jìn)行粒子仿真驗(yàn)證,得到理想的平行多注電子光學(xué)系統(tǒng)。然后對(duì)幾種聚焦磁場(chǎng)理論進(jìn)行了簡單的理論推導(dǎo),對(duì)所設(shè)計(jì)的平行多注電子光學(xué)系統(tǒng)的聚焦傳輸進(jìn)行設(shè)計(jì)和仿真,具體包括三種聚焦磁場(chǎng)分別是:均勻磁場(chǎng),PCM磁場(chǎng)和wiggler磁場(chǎng),分析了不同電子軌跡形成的原因,總結(jié)了聚焦磁場(chǎng)對(duì)平行多注電子注的聚焦規(guī)律,獲得了滿足要求的平行多注電子槍的磁系統(tǒng)。
[Abstract]:Up to now, microwave electronics has been developed for more than 100 years, and a relatively complete theoretical system has been established, which makes microwave vacuum devices become an important part of the development of modern science and technology. As an important part of microwave vacuum device, electron gun is also the heart of microwave vacuum device. Its design plays a decisive role in all the parameters of the device. With the continuous development of technology, from the initial Pierce electron gun, to now a variety of new electronic gun, a variety of electron guns emerge in order to meet the higher frequency, higher efficiency, higher gain, miniaturization, short response time and other requirements. Multi-beam electron gun and banded electron gun emerge as the times require. Multi-electron beam technology can effectively reduce the working voltage. At the same time, the power of multi-electron beam electron gun is higher than that of single electron beam electron gun at lower working voltage. As a new type of electron gun with multi-beam electron gun, its design is very important. In this paper, we focus on the generation of parallel electron beam and the control of electron beam transmission. The main function of the focusing system is to balance the space charge force of the electron beam in order to keep the electron beam in a certain shape. In order to avoid the electron beam being intercepted by the high frequency structure, guarantee its good circulation. The basic principle of the high current electron optical system and the important parameters of the high current electron gun are analyzed, and then the parallel multi beam electron gun is designed and simulated. The parameters of the electron gun were determined by requirement analysis, and then the particle simulation was carried out in CST to obtain the ideal parallel multi-beam electron optical system. Then, several theories of focusing magnetic field are deduced, and the focusing transmission of parallel multi-beam electron optical system is designed and simulated, including three kinds of focusing magnetic field: homogeneous magnetic field and wiggler magnetic field, respectively. The causes of the formation of different electron trajectories are analyzed, and the focusing rules of the focusing magnetic field for parallel multi-beam electron beams are summarized, and the magnetic system of parallel multi-beam electron guns is obtained.
【學(xué)位授予單位】：電子科技大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2017
【分類號(hào)】：TN103

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