一種新型高發(fā)射氧化物陰極的研制
發(fā)布時(shí)間:2018-08-18 19:06
【摘要】:本文利用等離子噴涂技術(shù),并在鎳過渡層和涂層中加入少量的鈧,研制出了一種新型的高發(fā)射氧化物陰極。結(jié)果顯示這種新型陰極在850℃,1μs脈寬時(shí),其發(fā)射電流密度可達(dá)107.8 A/cm~2;新型氧化物陰極電子發(fā)射密度大而且均勻,逸出功分布在1.52-1.58eV之間占到80%。
[Abstract]:In this paper, a new type of high emission oxide cathode has been developed by plasma spraying and adding a small amount of scandium into the nickel transition layer and coating. The results show that the emission current density of the new cathode can reach 107.8 A / cm ~ (-2) at 1 渭 s pulse width at 850 鈩,
本文編號(hào):2190396
[Abstract]:In this paper, a new type of high emission oxide cathode has been developed by plasma spraying and adding a small amount of scandium into the nickel transition layer and coating. The results show that the emission current density of the new cathode can reach 107.8 A / cm ~ (-2) at 1 渭 s pulse width at 850 鈩,
本文編號(hào):2190396
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