應(yīng)用于掃描干涉光刻系統(tǒng)的光束自動(dòng)對(duì)齊系統(tǒng)設(shè)計(jì)
發(fā)布時(shí)間:2018-03-08 07:29
本文選題:掃描干涉光刻 切入點(diǎn):光束自動(dòng)對(duì)齊 出處:《電子科技大學(xué)》2015年碩士論文 論文類型:學(xué)位論文
【摘要】:掃描干涉光刻技術(shù)作為一項(xiàng)現(xiàn)代大面積高精度光柵制造的主流技術(shù),兼具創(chuàng)新性和高效性,不論是制造精度還是制造效率均處于光柵制造技術(shù)的前列。光束自動(dòng)對(duì)齊系統(tǒng)作為掃描干涉光刻的子系統(tǒng),通過保證干涉光束在基底平面光斑重合、干涉光束與法線之間夾角相同,來減小干涉條紋的非線性。本文以光束自動(dòng)對(duì)齊系統(tǒng)為研究課題,對(duì)自動(dòng)對(duì)齊系統(tǒng)設(shè)計(jì)、自動(dòng)對(duì)齊系統(tǒng)各個(gè)模塊設(shè)計(jì)、自動(dòng)對(duì)齊系統(tǒng)控制算法以及自動(dòng)對(duì)齊系統(tǒng)對(duì)齊精度等進(jìn)行了一定的研究。首先,以國內(nèi)外光束對(duì)齊、光束校準(zhǔn)調(diào)研為基礎(chǔ),提出光路短適用于掃描干涉光刻系統(tǒng)的自動(dòng)對(duì)齊系統(tǒng)方案。本文所提自動(dòng)對(duì)齊系統(tǒng)方案巧妙利用透射光柵作為分光器件,利用其0級(jí)衍射光和+1級(jí)衍射光作為測(cè)量光束,位置敏感探測(cè)器(PSD)作為測(cè)量器件,電動(dòng)鏡座為執(zhí)行器件,設(shè)計(jì)了光路短、幾何尺寸小、易于集成的新型自動(dòng)對(duì)齊系統(tǒng)。其次,根據(jù)系統(tǒng)設(shè)計(jì)方案,對(duì)系統(tǒng)各個(gè)模塊性能需求進(jìn)行分析,設(shè)計(jì)各個(gè)模塊。分析透射光柵的需求,進(jìn)行理論衍射效率仿真與實(shí)際實(shí)驗(yàn)結(jié)果的對(duì)比;PSD性能參數(shù)的分析與實(shí)驗(yàn),包括PSD工作區(qū)域大小、位置分辨率、絕對(duì)測(cè)量精度、PSD數(shù)字化噪聲、工作時(shí)溫度變化以及振動(dòng)對(duì)PSD采樣的影響;對(duì)所用光源性能進(jìn)行了要求分析,對(duì)系統(tǒng)執(zhí)行器件電動(dòng)鏡座進(jìn)行了性能方面的測(cè)試。本部分創(chuàng)新點(diǎn)在于提出了適用于PSD分辨率與測(cè)量精度的測(cè)試方案與標(biāo)定方案。然后,根據(jù)前文方案設(shè)計(jì)與系統(tǒng)模塊設(shè)計(jì)的基礎(chǔ),提出適用于本新型光束自動(dòng)對(duì)齊系統(tǒng)的對(duì)齊方案。文章中沿用傳統(tǒng)的迭代對(duì)齊算法,提出利用上次調(diào)整結(jié)束的實(shí)測(cè)值作為下次迭代的初始值,提高自動(dòng)對(duì)齊系統(tǒng)的迭代對(duì)齊精度,減小x方向與y方向調(diào)節(jié)耦合帶來的誤差。最后,根據(jù)前文對(duì)自動(dòng)對(duì)齊系統(tǒng)方案、系統(tǒng)模塊設(shè)計(jì)、自動(dòng)對(duì)齊算法等的研究,制定實(shí)驗(yàn)方案,驗(yàn)證本文所提的自動(dòng)對(duì)齊系統(tǒng)(位置和角度對(duì)齊精度)滿足掃描干涉光刻對(duì)于自動(dòng)對(duì)齊子系統(tǒng)的對(duì)齊要求。
[Abstract]:Scanning interference lithography, as a mainstream technology in modern large area and high precision grating manufacturing, is both innovative and efficient. Both manufacturing accuracy and manufacturing efficiency are at the forefront of grating fabrication technology. The beam alignment system is used as the subsystem of scanning interference lithography by ensuring the coincidence of interference beams in the substrate plane. In order to reduce the nonlinearity of interference fringes, the angle between interference beam and normal line is the same. In this paper, the automatic alignment system is designed, and each module of automatic alignment system is designed. The control algorithm of automatic alignment system and the alignment accuracy of automatic alignment system are studied. Firstly, based on the research of beam alignment and beam calibration at home and abroad, A scheme of automatic alignment system for scanning interference lithography system is proposed, in which the transmission grating is used as the light splitter, and the 0-order diffraction light and the 1-order diffraction light are used as the measuring beams. The position sensitive detector (PSD) is used as the measuring device, and the electric mirror seat is the actuator. A new type of automatic alignment system with short optical path, small geometry size and easy integration is designed. Secondly, according to the design scheme of the system, a new type of automatic alignment system is designed. The performance requirements of each module of the system are analyzed, and each module is designed. The requirements of transmission grating are analyzed, and the theoretical diffraction efficiency simulation is compared with the actual experimental results. The performance parameters of PSD are analyzed and experimented, including the size of the PSD working area. Position resolution, absolute measurement accuracy, digital noise, temperature change and vibration effect on PSD sampling are analyzed, and the performance of the light source used is analyzed. The performance of the electric mirror pedestal of the executive device of the system is tested. The innovation of this part is to put forward the test scheme and calibration scheme suitable for the resolution and measurement accuracy of the PSD. According to the basis of the previous scheme design and system module design, a new alignment scheme is proposed for the new beam automatic alignment system. In this paper, the traditional iterative alignment algorithm is used. In order to improve the accuracy of the iterative alignment of the automatic alignment system and reduce the error caused by the coupling between the x and y directions, it is proposed to use the measured values at the end of the last adjustment as the initial value of the next iteration. Finally, according to the scheme of the automatic alignment system, The system module design, automatic alignment algorithm and so on are studied, and the experimental scheme is established to verify that the automatic alignment system (position and angle alignment accuracy) proposed in this paper meets the requirements of scanning interference lithography for automatic alignment subsystem.
【學(xué)位授予單位】:電子科技大學(xué)
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2015
【分類號(hào)】:TN305.7
【參考文獻(xiàn)】
相關(guān)碩士學(xué)位論文 前2條
1 林永濤;PSD綜合性能檢測(cè)系統(tǒng)的研制[D];浙江大學(xué);2012年
2 ?;多象限光電探測(cè)器性能仿真與測(cè)試技術(shù)研究[D];南京理工大學(xué);2012年
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