發(fā)布時間：2018-03-02 06:20

  本文關(guān)鍵詞： 微透鏡及其陣列 SU-8光刻膠 光刻 表面張力 Surface Evolver　出處：《中國科學(xué)技術(shù)大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：隨著微光機電系統(tǒng)(MOEMS)的迅猛發(fā)展,人們對于光學(xué)元件的微型化的需求日益增加。而透鏡作為光學(xué)系統(tǒng)中非常重要的元件,透鏡的微型化也成為研究熱點。近年來,有很多科研機構(gòu)和高等院校在進行針對微透鏡研制的工作,提出了許多種微透鏡制作方法。其中,光刻膠熱熔法成為很多科研人員的研究重點。本文基于深紫外光刻技術(shù),提出一種新的光刻膠微透鏡制作方法,利用負性光刻膠在熱熔時產(chǎn)生曲面的方法來制作微透鏡。本文主要開展了以下工作： 1.調(diào)研了微透鏡的制作方法,了解了微透鏡制作方法的國內(nèi)外研究現(xiàn)狀和進展。研究SU-8膠光刻工藝,基于傳統(tǒng)的光刻膠熱熔法,提出一種新的利用光刻膠熱熔制作微透鏡的方法。對微透鏡的成型機理進行了分析和討論,從多個角度分析了各因素對微透鏡的影響。對本文的微透鏡制作方法進行優(yōu)缺點的分析,分析了本方法制作的微透鏡的一致性和均勻性�；诒疚奶岢龅墓饪棠z微透鏡制作方法,研究了各種工藝參數(shù)對微透鏡形貌的影響。針對不同的光刻膠厚度、微透鏡寬度和后烘降溫過程,進行了大量的實驗。 2.為了獲得表面形貌和光學(xué)特性,利用三種測量手段來測量微透鏡的相關(guān)數(shù)據(jù),分別是臺階儀測量、光學(xué)顯微鏡和掃描電子顯微鏡測量和光學(xué)測量裝置,通過臺階儀和顯微鏡可以獲得微透鏡的曲面和形貌,通過光學(xué)測量裝置可以獲得微透鏡的光學(xué)特性�；谝陨舷嚓P(guān)實驗數(shù)據(jù),分析各工藝參數(shù)對微透鏡形貌及其光學(xué)性能的影響。針對光刻膠微結(jié)構(gòu)的寬度、光刻膠厚度、后烘降溫過程對光刻膠微透鏡的影響進行了討論和分析。通過兩種方法計算和測得了微透鏡的焦距,對微透鏡的光學(xué)特性進行了分析和評價。最后分析了本實驗制作的微透鏡的填充因子。通過以上數(shù)據(jù)和分析,我們得出本文制作的微透鏡有以下優(yōu)點：1.本文制作的微透鏡具有超長的焦距,遠遠大于傳統(tǒng)光刻膠熱熔法制作的微透鏡的焦距。2.本文的微透鏡制作方法可靠性好,工藝寬容性好。3.本文制作的微透鏡的填充因子很大,實驗中的填充因子最大可達98.5%。 3.對微透鏡的成型機理進行了分析,并用Surface Evolver進行了模擬仿真。模擬仿真結(jié)果較好地符合了實驗結(jié)果,證明了微透鏡的主要成型機理是利用熱熔的光刻膠受表面張力影響而形成所需曲面。通過軟件仿真模擬,驗證了對于微透鏡成型機理的分析和假設(shè)。
[Abstract]:With the rapid development of MOEMSs, the demand for the miniaturization of optical elements is increasing day by day. As a very important element in optical system, the miniaturization of lenses has become a hot topic in recent years. Many scientific research institutions and universities are working on the development of microlenses, and many kinds of microlens fabrication methods have been put forward. Among them, thermal melting of photoresist has become the research focus of many researchers. This paper is based on deep ultraviolet lithography. A new method of fabricating photoresist microlens is proposed. The method of producing surface of negative photoresist in hot melt is used to fabricate the microlens. The main work of this paper is as follows:. 1. The fabrication method of microlens is investigated, and the present situation and progress of the fabrication method of microlens at home and abroad are discussed. The process of SU-8 photoresist lithography is studied, which is based on the traditional hot melting method of photoresist. A new method of fabricating microlens by thermal melting of photoresist is presented. The forming mechanism of microlens is analyzed and discussed. The influence of various factors on the microlens is analyzed from several angles. The advantages and disadvantages of the fabrication method of the microlens in this paper are analyzed. The uniformity and uniformity of the microlens made by this method are analyzed. Based on the method proposed in this paper, the influence of various technological parameters on the morphology of the microlens is studied. A large number of experiments were carried out on the width of the microlens and the cooling process after drying. 2. In order to obtain surface morphology and optical properties, three methods of measurement are used to measure the relevant data of the microlens, namely, step meter measurement, optical microscope and scanning electron microscope measurement and optical measuring device. The surface and morphology of the microlens can be obtained by the step instrument and microscope, and the optical properties of the microlens can be obtained by the optical measuring device. The influence of various technological parameters on the morphology and optical properties of microlens was analyzed. The effect of post-drying process on the photoresist microlens was discussed and analyzed. The focal length of the microlens was calculated and measured by two methods. The optical properties of the microlens were analyzed and evaluated. Finally, the filling factor of the microlens was analyzed. We draw the conclusion that the microlens made in this paper has the following advantages: 1. The microlens made in this paper has an extremely long focal length, which is much larger than the focal length of the microlens made by traditional photolithography hot melt method. The filling factor of the microlens made in this paper is very large, and the maximum filling factor in the experiment is 98.55.3. 3. The forming mechanism of the microlens is analyzed and simulated by Surface Evolver. The simulation results are in good agreement with the experimental results. It is proved that the main forming mechanism of the microlens is to form the required surface by the influence of the surface tension on the hot melt photoresist, and the analysis and hypothesis of the forming mechanism of the microlens are verified by the software simulation.
【學(xué)位授予單位】：中國科學(xué)技術(shù)大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN305.7

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