本文關(guān)鍵詞： 同步輻射 單色器 線切割 研磨拋光 搖擺曲線　出處：《中國(guó)科學(xué)院研究生院（上海應(yīng)用物理研究所）》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：同步輻射具有寬頻譜、高亮度、高通量等優(yōu)良特性，迅速發(fā)展到第三代、第四代同步輻射光源。同步輻射光源是集X射線光學(xué)、熱學(xué)、力學(xué)、真空科學(xué)、機(jī)械科學(xué)、電子學(xué)等科學(xué)為一體的系統(tǒng)性大工程。截止2009年上海光源一期工程圓滿完成，時(shí)至今日，首批7線8站已經(jīng)在不同科學(xué)領(lǐng)域取得重大成果。根據(jù)上海光源的規(guī)劃，預(yù)計(jì)將設(shè)計(jì)60多條光束線與近百個(gè)實(shí)驗(yàn)站。而每條光束線從光源引出到實(shí)驗(yàn)站都要經(jīng)過(guò)單色、聚焦、準(zhǔn)直等過(guò)程。每一個(gè)環(huán)節(jié)都需要特殊的光學(xué)元件來(lái)實(shí)現(xiàn)。目前，上海光源用于光束線傳輸?shù)墓鈱W(xué)元件，大部分采用國(guó)內(nèi)設(shè)計(jì)，國(guó)外加工的模式，這樣既影響效率又影響后期維護(hù)。而目前上海光源二期光束線正在推進(jìn)，并且對(duì)晶體光學(xué)元件的需求量遠(yuǎn)大于一期工程。為了使晶體加工成為上海光源一項(xiàng)自主的技術(shù)，為上海光源二期光束線預(yù)期完成建設(shè)任務(wù)提供保障，而且還能夠?yàn)楣庠匆黄谒玫降墓鈱W(xué)元件進(jìn)行更新?lián)Q代，還可為今后國(guó)內(nèi)外的同步輻射光學(xué)元件的設(shè)計(jì)與加工給予技術(shù)支撐。于是開(kāi)展本課題的研究，主要研究?jī)?nèi)容如下： 分析對(duì)比了不同單色器晶體的設(shè)計(jì)理論，并知道能夠解釋晶體的X射線衍射的主要有運(yùn)動(dòng)學(xué)衍射理論和動(dòng)力學(xué)衍射理論。而動(dòng)力學(xué)衍射理論最適合解釋單色器晶體衍射。根據(jù)動(dòng)力學(xué)衍射理論，單色器晶體的衍射類型主要有Laue和Bragg衍射，并分析二者的不同之處。為了獲得高能量分辨與更好的準(zhǔn)直光，結(jié)合衍射動(dòng)力學(xué)理論，利用多級(jí)衍射、晶體斜切等方法設(shè)計(jì)單晶硅Channel-cut型單色器。最后根據(jù)上海光源小角散射線站的Bonse-Hart相機(jī)系統(tǒng)需要，設(shè)計(jì)Channel-cut型準(zhǔn)直晶體與分析晶體，并通過(guò)理論模擬計(jì)算晶體單色器的搖擺曲線，最后計(jì)算出準(zhǔn)直晶體的能量分辨率。 研究單色器晶體線切割成形、研磨拋光工藝。從已經(jīng)很成熟的半導(dǎo)體及光伏產(chǎn)業(yè)晶片加工工藝中汲取經(jīng)驗(yàn)，研究出適合晶體單色器的加工工藝。本課題主要研究單晶硅分光晶體的加工工藝與其定向方法。首先，研究單晶硅精確定向方法；其次，利用往復(fù)式固著金剛石線切割方式切割Channel-cut型分光晶體成形，并研究了影響線切割過(guò)程的一些工藝參數(shù)，如：金剛石的顆粒度、金剛線的疲勞程度、切割過(guò)程中的切速比，以及往復(fù)切割次數(shù)等影響晶體表面粗糙度的工藝參數(shù)。再次，研究單晶硅的機(jī)械化學(xué)研磨工藝，主要研究研磨材料的選取、研磨料的顆粒度、研磨過(guò)程中的相對(duì)速度、研磨壓力，以及影響材料去除率等影響研磨質(zhì)量的工藝參數(shù)。最后，再簡(jiǎn)單嘗試研究晶體拋光技術(shù)，同樣選擇機(jī)械化學(xué)的方式，，并利用金剛石與二氧化硅拋光液，聚氨酯與磨砂革拋光墊拋光單晶硅。最終實(shí)現(xiàn)單晶硅的塑性區(qū)域加工，得到符合光束線對(duì)單色器的設(shè)計(jì)要求。 簡(jiǎn)單給出單色器晶體設(shè)計(jì)與加工完成后的重要評(píng)價(jià)參數(shù)，并研究這些評(píng)價(jià)參數(shù)的檢測(cè)方法。文中提出影響單色器主要的參數(shù)，如：反射面粗糙度、反射面的面形、以及單色器晶體的搖擺曲線，和各衍射面的斜切角。結(jié)合上海光源小角散射線站設(shè)計(jì)的Bonse-Hart相機(jī)系統(tǒng)所設(shè)計(jì)Channel-cut型準(zhǔn)直晶體與分析晶體，檢測(cè)出該晶體單色器反射面的粗糙度、面形、搖擺曲線，和各個(gè)反射面的斜切角。通過(guò)實(shí)驗(yàn)檢測(cè)結(jié)果與理論計(jì)算進(jìn)行對(duì)比，總結(jié)單色器晶體設(shè)計(jì)與加工過(guò)程中存在的問(wèn)題，并提出改進(jìn)與完善的措施。
[Abstract]:Synchrotron radiation has wide spectrum, high brightness, high throughput and excellent characteristics, the rapid development of the third generation, fourth generation synchrotron radiation source. The synchrotron radiation source is the set of X ray optics, calorifics, mechanics, vacuum science, mechanical science, electronics and science as a whole system of big projects. By the end of 2009 the first phase of the project of Shanghai light source the successful completion of today, the first batch of 7 line 8 station has made great achievements in various scientific fields. According to the Shanghai light source planning, is expected to design more than 60 beamlines and experimental stations. Nearly 100 focus and each beam line from the light source is led to the experimental station to go through the process, monochrome, alignment. Every links need special optical components to achieve. At present, the Shanghai light source for optical elements for beam line transmission, most of the domestic and foreign design, processing mode, so as to affect the efficiency and effect of maintenance at present. Shanghai two light beam line is advancing, and the demand for crystal optical element is far greater than the first phase of the project. In order to make the crystal processing become a self Shanghai light source technology, to provide protection for Shanghai light source beamline two expected to complete the construction tasks, but also for a light source optical element used to update replacement, but also give the technical support for the design and manufacture of synchrotron radiation optical elements in the future at home and abroad. So the research of this topic, the main research contents are as follows:
Analysis and comparison of the design theory of different monochromator crystal, and know the kinematical diffraction theory and dynamical diffraction theory can explain the main crystal X ray diffraction. The dynamical diffraction theory explain the most suitable monochromator crystal diffraction. Based on the dynamical theory of diffraction, diffraction type monochromator crystal are mainly Laue and Bragg diffraction analysis, and the difference between the two. In order to obtain high energy resolution and collimated light better, combined with the dynamical theory of diffraction, using multilevel diffraction, crystal oblique design method of Channel-cut type silicon monochromator. Finally, according to the needs of the Bonse-Hart camera system of Shanghai light source of small angle scattering line station, the design of Channel-cut type crystals and crystal alignment analysis, and calculation of the rocking curve of crystal monochromator through the simulation theory, and finally calculate the collimation crystal energy resolution.
The forming of monochromator crystal cutting, grinding and polishing process. Learn from the experience of semiconductor and photovoltaic industry wafer processing technology has been very mature in the research process for the machining process of crystal monochromator. Its orientation method of the main research topics of monocrystalline silicon analyzer crystal. First, research on monocrystalline silicon precise orientation method; secondly, cut Channel-cut type optical crystal forming by using a reciprocating fixed diamond wire, some process parameters, and the effects of the wire cutting process such as particle size of diamond, diamond wire fatigue degree, cutting speed of the cutting process, influence of crystal surface roughness parameters and degree of reciprocating cutting times. Again, chemical mechanical polishing study on the selection process of monocrystalline silicon, main abrasive materials, abrasive particle size, the relative speed of the grinding process, grinding pressure, The removal process parameters affecting the quality of grinding rate and effect of material. Finally, a simple attempt to study the crystal chemical mechanical polishing technology, choose the same way, diamond polishing liquid and silicon dioxide and using polyurethane nubuck leather polishing pad and polishing silicon. The plastic zone ultimately processing silicon, to be consistent with the design of the monochromator beamline requirements.
An important evaluation design and simple processing is given after the completion of the monochromator crystal parameters, detection methods and study these parameters. In this paper the influence of main parameters such as: monochromator, reflecting surface roughness, surface reflectance, and crystal monochromator rocking curve, and the diffraction plane oblique angle. Combining with the Bonse-Hart camera system design in Shanghai light small angle scattering line station designed by Channel-cut and analysis of the collimation of crystal crystal, crystal monochromator reflecting surface roughness, surface shape detection, rocking curve, and each reflector of the oblique angle. Through the experimental results and the theoretical calculation were compared, summarized the monochromator crystal design and machining process, and put forward the measures of improvement and perfection.

【學(xué)位授予單位】：中國(guó)科學(xué)院研究生院（上海應(yīng)用物理研究所）
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TN304.12

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本文編號(hào)：1526972