基于SOI光學(xué)諧振腔的表面光滑機(jī)理及其關(guān)鍵技術(shù)研究
本文關(guān)鍵詞: 諧振腔 側(cè)壁粗糙度 高溫氧化 損耗 品質(zhì)因數(shù) 出處:《中北大學(xué)》2015年碩士論文 論文類型:學(xué)位論文
【摘要】:基于絕緣體上硅SOI(Silicon-on-insulator,SOI)的光學(xué)諧振腔因其具有集成度高、功耗低、靈敏度高等特點(diǎn)而廣泛應(yīng)用在光學(xué)通信、光學(xué)互聯(lián)以及高靈敏度傳感器等技術(shù)領(lǐng)域,有著重要的現(xiàn)實(shí)意義和潛在應(yīng)用價(jià)值。然而光波導(dǎo)器件由于制備過程中不可避免的粗糙側(cè)壁的存在,使其散射損耗較大,嚴(yán)重制約了大尺寸、高品質(zhì)因數(shù)Q(Quality Factor)光學(xué)諧振腔的實(shí)現(xiàn)。因此,本文從SOI光波導(dǎo)表面光滑機(jī)理展開討論,探究降低波導(dǎo)側(cè)壁粗糙度,提高其品質(zhì)因數(shù)的優(yōu)化方法。 首先,文章對(duì)光學(xué)諧振腔的耦合傳輸理論進(jìn)行了詳細(xì)的分析與闡述,并介紹了衡量光學(xué)微腔諧振特性的幾個(gè)重要指標(biāo),同時(shí)從工藝制備角度揭示了側(cè)壁粗糙度的產(chǎn)生機(jī)理,并從理論上分析了粗糙度對(duì)光學(xué)諧振腔傳輸損耗及諧振特性的影響; 其次,通過微機(jī)電系統(tǒng)MEMS(Micro-electro-mechanical-systems)技術(shù)制備了SOI圓環(huán)型和跑道型諧振腔,并對(duì)制備流程進(jìn)行了簡(jiǎn)要說明;通過對(duì)高溫?zé)嵫趸に囋矸治黾捌鋵?duì)波導(dǎo)側(cè)壁光滑處理的優(yōu)勢(shì),我們制定了單次氧化和分級(jí)氧化工藝方案,并通過去除金屬標(biāo)記、氧化及后續(xù)的腐蝕實(shí)驗(yàn)完成了光滑處理過程。 最后,我們搭建了耦合實(shí)驗(yàn)測(cè)試平臺(tái),對(duì)兩種氧化工藝前后的光學(xué)微腔的傳輸性能進(jìn)行了測(cè)試與分析,驗(yàn)證了熱氧化工藝對(duì)于波導(dǎo)表面光滑優(yōu)化的重要作用;最重要的是,,相比單次氧化工藝,分級(jí)氧化工藝對(duì)于降低波導(dǎo)傳輸損耗、提高諧振腔品質(zhì)因數(shù)方面具有更大的優(yōu)勢(shì)。 本研究不僅為低損耗、大尺寸、高Q值的光學(xué)諧振腔的實(shí)現(xiàn)奠定了重要的研究基礎(chǔ),對(duì)于微光學(xué)器件、光網(wǎng)絡(luò)、光通訊,特別是對(duì)于納米光波導(dǎo)陀螺等新型器件的研制,更具有重要的研究意義和科學(xué)價(jià)值。
[Abstract]:Because of its high integration, low power consumption and high sensitivity, the optical resonator based on silicon SOI on insulator has been widely used in optical communication, optical interconnection and high sensitivity sensors. It has important practical significance and potential application value. However, due to the inevitable existence of rough sidewalls in the fabrication process, the scattering loss of optical waveguide devices is large, which seriously restricts the large size. The realization of high quality Q quality factor optical resonator. Therefore, this paper discusses the surface smoothing mechanism of SOI optical waveguide, and explores the optimization method to reduce the roughness of the side wall of the waveguide and improve its quality factor. First of all, the coupling transmission theory of optical resonator is analyzed and expounded in detail, and several important indexes to measure the resonance characteristics of optical microcavity are introduced. At the same time, the mechanism of side wall roughness is revealed from the point of view of process preparation. The influence of roughness on the transmission loss and resonant characteristics of optical resonator is analyzed theoretically. Secondly, SOI ring resonators and runway resonators are fabricated by MEMS Micro-electro-mechanical-systems technology, and the fabrication process is briefly explained, and the advantages of high temperature thermal oxidation technology and smooth treatment of waveguide side wall are analyzed. The single oxidation and step oxidation processes were worked out, and the smooth treatment process was completed by removing metal marks, oxidation and subsequent corrosion experiments. Finally, we build a coupled experimental test platform to test and analyze the transmission performance of the optical microcavity before and after the two oxidation processes. The results show that the thermal oxidation process plays an important role in the smooth optimization of the waveguide surface, and the most important is that the thermal oxidation process plays an important role in the smooth optimization of the waveguide surface. Compared with the single oxidation process, the step oxidation process has more advantages in reducing the waveguide transmission loss and improving the quality factor of the resonator. This study not only lays an important foundation for the realization of optical resonators with low loss, large size and high Q value, but also for the development of micro optical devices, optical networks, optical communication, especially nanoscale optical waveguide gyroscopes, etc. More important research significance and scientific value.
【學(xué)位授予單位】:中北大學(xué)
【學(xué)位級(jí)別】:碩士
【學(xué)位授予年份】:2015
【分類號(hào)】:TN629.1
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