本文關(guān)鍵詞： 聚焦離子束刻蝕技術(shù) 軟刻蝕技術(shù) 三維加工 聚二甲基硅氧烷 模板　出處：《西南科技大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：聚二甲基硅氧烷(polydimethylsiloxane,以下簡稱PDMS)軟模板在生物醫(yī)藥、物理化學(xué)等領(lǐng)域具有重要的應(yīng)用價值。而PDMS軟模板的制備源于母模板結(jié)構(gòu)的制造,因此制備出高分辨率、精細(xì)的三維母模板結(jié)構(gòu)是PDMS軟模板結(jié)構(gòu)的關(guān)鍵。一般以光刻膠、Si和Si O2等作為母模板結(jié)構(gòu),目前加工母模板結(jié)構(gòu)的方法有干涉光刻技術(shù)和電子束光刻技術(shù)等。但是這些方法制備PDMS軟刻蝕用母模板工藝復(fù)雜,需要旋涂光刻膠、曝光、顯影、定影和反應(yīng)離子束刻蝕等步驟,并且其加工的結(jié)構(gòu)一般為準(zhǔn)三維結(jié)構(gòu)�；谏鲜銮闆r,本文提出利用聚焦離子束刻蝕技術(shù)制備PDMS軟刻蝕用母模板,并在Si基底上制備出15?m×15?m的輪廓清晰的三維結(jié)構(gòu)母模板,三甲基氯硅烷作為抗粘連層旋涂于Si基底表面,其后旋涂PDMS預(yù)聚物復(fù)制模鑄出與Si基底表面圖案互補(bǔ)的三維結(jié)構(gòu)。通過接觸角測量儀對Si基底表面疏水性能和用AFM對PDMS樣品表面形貌進(jìn)行表征。研究結(jié)果表明,特征圖形及小尺寸結(jié)構(gòu)都得到了很好的轉(zhuǎn)移,15?m×15?m結(jié)構(gòu)中小尺寸圓柱直徑713.56nm,高度51.39nm也得到很好的倒模。其中用庚烷稀釋PDMS預(yù)聚物,倒模出的PDMS軟模板結(jié)構(gòu)縱橫比達(dá)到1:1。該方法相對于傳統(tǒng)軟刻蝕用母模板制備技術(shù),加工的三維結(jié)構(gòu)具有操作步驟簡單、制備周期短的特點(diǎn),是一種有效的制備軟刻蝕母模板方法。聚焦離子束刻蝕技術(shù)在PDMS軟刻蝕用母模板結(jié)構(gòu)中的成功制作,有助于進(jìn)一步探索其在更小尺寸及微納米結(jié)構(gòu)器件中的應(yīng)用。
[Abstract]:Polydimethylsiloxane polydimethylsiloxane (hereinafter referred to as PDMS) soft template in biomedicine. Physical chemistry and other fields have important application value, and the preparation of PDMS soft template originated from the manufacture of mother template structure, so the preparation of high resolution. Fine 3D master template structure is the key of PDMS soft template structure. Generally, photoresist Si and Sio 2 are used as master template structure. At present, the methods of fabricating the structure of mother template include interference lithography and electron beam lithography, etc. But these methods are very complicated for preparing PDMS soft etching, which require spin coated photoresist, exposure and development. Fixing and reactive ion beam etching and so on, and the structure of the processing is generally quasi-three-dimensional structure. Based on the above situation, this paper proposed the use of focused ion beam etching technology to prepare the mother template for PDMS soft etching. 15? M 脳 15? M has a clear three-dimensional structure template and trimethylchlorosilane as an anti-adhesion layer is spin-coated on the surface of Si substrate. After spin-coated PDMS prepolymer, the 3D structure complementary to the surface pattern of Si substrate was molded out. The hydrophobic properties of Si substrate surface and the surface morphology of PDMS sample were measured by contact angle measuring instrument and AFM respectively. Characterization. The results show that. Both the feature figure and the small size structure have been well transferred. M 脳 15? The diameters of small and medium size cylinders with m structure are 713.56 nm and the height is 51.39 nm. The PDMS prepolymer is diluted with heptane. The aspect ratio of inverted PDMS soft template structure is 1: 1.Compared with the traditional mother template preparation technology, the 3D structure fabricated by this method has the characteristics of simple operation steps and short preparation period. It is an effective method to prepare soft etching mother template. Focusing ion beam etching technology is successfully made in the structure of PDMS soft etching mother template. It is helpful to further explore its application in smaller size and micro-nano structure devices.
【學(xué)位授予單位】：西南科技大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN305.7

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本文編號：1477149