本文關(guān)鍵詞： 薄膜 極紫外光刻 碳污染 清洗技術(shù) 反射率　出處：《中國(guó)激光》2017年03期 　論文類型：期刊論文

【摘要】：極紫外光刻系統(tǒng)中的碳污染會(huì)降低多層膜反射率,在保證光學(xué)元件性能的前提下,如何選擇碳清洗工藝是一項(xiàng)重要課題。通過(guò)對(duì)不同清洗工藝的原理分析,揭示了不同工藝對(duì)多層膜反射率的影響主要體現(xiàn)在膜層氧化、刻蝕及表面粗糙度劣化等方面�；跁r(shí)域有限差分方法及總積分散射理論,研究了不同影響因素與多層膜反射率的關(guān)系。結(jié)果表明,膜層氧化及表面粗糙度劣化是導(dǎo)致多層膜反射率下降的主要因素,而刻蝕的影響相對(duì)較小�；谝陨戏治鼋Y(jié)果,射頻氫等離子體及原子氫清洗技術(shù),在去除光學(xué)元件表面沉積碳的同時(shí),不會(huì)顯著降低光學(xué)元件性能,可優(yōu)先考慮采用。
[Abstract]:Carbon pollution in the extreme ultraviolet lithography system will reduce the reflectivity of multilayer films. How to select the carbon cleaning process is an important subject on the premise of ensuring the performance of optical elements. The principle of different cleaning processes is analyzed. It is revealed that the effects of different processes on the reflectivity of multilayer films are mainly reflected in the aspects of film oxidation, etching and surface roughness degradation, based on the finite-difference time-domain method and the total integral scattering theory. The relationship between different factors and the reflectivity of multilayer films is studied. The results show that oxidation and surface roughness deterioration are the main factors leading to the decrease of multilayer reflectivity. Based on the above analysis results, RF hydrogen plasma and atomic hydrogen cleaning technology can not significantly reduce the performance of optical elements while removing carbon deposition on the surface of optical elements. Priority may be given to adoption.
【作者單位】： 中國(guó)科學(xué)院長(zhǎng)春光學(xué)精密機(jī)械與物理研究所應(yīng)用光學(xué)國(guó)家重點(diǎn)實(shí)驗(yàn)室;中國(guó)科學(xué)院大學(xué);
【基金】：國(guó)家自然科學(xué)基金(61404139) 國(guó)家科技重大專項(xiàng)(2012ZX02702001-005) 應(yīng)用光學(xué)國(guó)家重點(diǎn)實(shí)驗(yàn)室自主基金(Y5743FQ158) 吉林省重點(diǎn)科技成果轉(zhuǎn)化項(xiàng)目(20150307039GX)
【分類號(hào)】：TN23
【正文快照】： 光學(xué)元件在極紫外光(EUV)的輻照作用下會(huì)產(chǎn)生碳污染的現(xiàn)象[1]。真空腔內(nèi)殘余的氣體分子,以及光刻膠與電子學(xué)元器件等釋放出的有機(jī)物,在EUV光作用下會(huì)裂解產(chǎn)生游離碳,并吸附沉積在光學(xué)元件表面[2-5]。碳對(duì)EUV光有較強(qiáng)的吸收,光學(xué)元件的反射率會(huì)急劇下降。研究表明[6],如未采取

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相關(guān)期刊論文 前4條

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