本文關(guān)鍵詞：光刻機換臺過程控制算法研究　出處：《哈爾濱工業(yè)大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

  更多相關(guān)文章： 電機模型 復(fù)合控制 變結(jié)構(gòu)控制 誤差模型

【摘要】：光刻機系統(tǒng)集合了多種學(xué)科,涉及控制、測量、檢測、光學(xué)、電氣等各個專業(yè)領(lǐng)域,代表一個國家集成制造領(lǐng)域的最高水平。光刻機運行性能的提高需要光學(xué)測量的準確性,光刻機運行的穩(wěn)定受制于電氣裝置的穩(wěn)定性,光刻機運行的精度依賴于控制算法的選取。選取適合光刻機運行狀態(tài)的控制算法是保證光刻機在高頻響、高精度運行環(huán)境下的關(guān)鍵。精密運動平臺作為光刻機的基礎(chǔ)部分,上面馱載著掩膜臺和硅片臺。精密運動平臺采用了H型結(jié)構(gòu),換臺過程就是在此運動平臺上完成的。換臺過程是整個光刻機運行的關(guān)鍵步驟。換臺步驟的失敗將直接導(dǎo)致光刻機系統(tǒng)的失敗,并且將會對換臺所需機械部分造成損傷,因此必須細致的分析光刻機系統(tǒng)的換臺過程才能夠獲得精密控制方法。整個換臺的步驟需要公轉(zhuǎn)電機、自轉(zhuǎn)電機以及X、Y向電機的精密配合。X、Y向的電機為旋轉(zhuǎn)電機進行換臺動作提供空間,因此需要精確的定位。因此首先分析了直線電機,從線性模型和非線性模型建立了直線電機的數(shù)學(xué)模型,然后根據(jù)項目的發(fā)展要求,采用了復(fù)合控制策略對其進行控制,分別為前饋控制、反饋控制、徑向基函數(shù)。公轉(zhuǎn)電機是整個換臺過程的核心,連接著左右兩側(cè)的自轉(zhuǎn)電機,一方面完成旋轉(zhuǎn)動作,另一方面控制著自轉(zhuǎn)電機的位置精度,使其能夠正常的對X向電機完成空間上的位置匹配。公轉(zhuǎn)電機在實際運行中控制結(jié)構(gòu)不斷發(fā)生變化,建立公轉(zhuǎn)電機的數(shù)學(xué)模型以后,采用了變結(jié)構(gòu)的控制策略,并通過仿真進行驗證。在光刻機換臺過程中,機械部分的誤差積累一直是一個難題,將直接使得機械器件之間不能夠精確的匹配,會造成機械部分的相互觸碰,損傷機械部分裝置,換臺過程是一個多體過程,通過引入多體系統(tǒng),利用齊次坐標的方式建立了換臺過程中所需器件的位置表達式,進而來確定光刻機系統(tǒng)中器件之間的相對位置,從而進行誤差補償。在換臺過程中的調(diào)試中,精密運動平臺運行十分良好,方便光刻機換臺過程中的控制系統(tǒng)的調(diào)試,有利于換臺步驟控制算法的驗證。
[Abstract]:Lithography system is a collection of a variety of disciplines, including control, measurement, detection, optics, electrical and other professional fields. It represents the highest level in the field of integrated manufacturing in a country. The improvement of the performance of the lithography machine requires the accuracy of optical measurement, and the stability of the lithography machine is limited by the stability of the electrical device. The operation accuracy of lithography machine depends on the selection of control algorithm. The choice of control algorithm suitable for the operation state of lithography machine is to ensure the high frequency response of lithography machine. Precision motion platform is the basic part of lithography machine, which is loaded with mask and silicon chip platform. The precision motion platform adopts H-type structure. The switch process is completed on this moving platform. The replacement process is the key step of the whole lithography machine operation. The failure of the replacement step will directly lead to the failure of the lithography system. And it will cause damage to the mechanical part of the platform change, so we must analyze the process of the lithography system to obtain the precision control method. The whole step of changing the platform needs the rotary motor. The rotation motor and the XY direction motor provide the space for the rotating motor to change the platform, so the precise positioning is needed. Therefore, the linear motor is analyzed firstly. The mathematical model of linear motor is established from the linear model and the nonlinear model. Then according to the development requirements of the project, the compound control strategy is used to control the linear motor, which are feedforward control and feedback control respectively. Radial basis function. The rotary motor is the core of the whole stage change process, connected to the left and right sides of the rotation motor, on the one hand complete the rotation action, on the other hand, control the position accuracy of the rotation motor. So that it can normally complete the space position matching of the X-direction motor. The control structure of the rotary motor changes constantly in the actual operation. After establishing the mathematical model of the rotating motor, the variable structure control strategy is adopted. The error accumulation of the mechanical part is always a difficult problem in the process of the lithography machine changing, which will directly make the mechanical parts can not be accurately matched, which will cause the mechanical parts to touch each other. The mechanical part of the damage, the replacement process is a multi-body process, through the introduction of multi-body system, using homogeneous coordinates to establish the position of the required device in the process of platform change expression. Then to determine the relative position of the components in the lithography system, so as to compensate for the error. In the process of debugging, the precision moving platform runs very well. It is convenient to debug the control system in the process of changing the lithography machine and to verify the step control algorithm.
【學(xué)位授予單位】：哈爾濱工業(yè)大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN305.7

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相關(guān)期刊論文 前2條

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