本文關(guān)鍵詞：基于擴展Zernike多項式的投影物鏡全視場像差優(yōu)化研究　出處：《中國科學院研究生院（光電技術(shù)研究所）》2015年碩士論文　論文類型：學位論文

  更多相關(guān)文章： 投影物鏡 像差函數(shù) 靈敏度矩陣 計算機輔助裝調(diào)

【摘要】：投影物鏡是光刻機最為核心的分系統(tǒng),其設(shè)計和制造的技術(shù)難度極大。投影物鏡具有高NA、大視場的特點,對成像質(zhì)量要求極高,達到了光學衍射極限。在投影物鏡的制造過程中,加工公差和裝調(diào)公差也都要求極為嚴格。因此,在投影物鏡的設(shè)計與制造過程中,像質(zhì)評價和像質(zhì)補償極為重要。像質(zhì)評價貫穿整個投影物鏡的設(shè)計過程,是系統(tǒng)優(yōu)化和像質(zhì)補償?shù)闹匾罁?jù)。像質(zhì)補償可以確保實現(xiàn)投影物鏡的各項技術(shù)指標,協(xié)調(diào)各階段的關(guān)鍵技術(shù),降低制造成本。本文引入了一種新的多項式表示投影物鏡的全局波像差分布,分析了相關(guān)多項式的像差特性,并將基于該多項式建立全視場補償數(shù)學模型應(yīng)用于投影物鏡的計算機輔助裝調(diào)過程中。本文主要針對Zernike多項式在描述投影物鏡綜合像差特性的不足,在Zernike多項式的基礎(chǔ)上擴展了一種新的多項式表示投影物鏡的全視場像差分布-正交像差函數(shù)(OAF);利用OAF分別描述了投影物鏡在含加工誤差和不含加工誤差下的全視場像差分布;對比分析了OAF表示的準確性和波像差特性。OAF能夠?qū)饪涛镧R的像差進行更細的分類和量化,不僅可以描述共軸光學系統(tǒng)的旋轉(zhuǎn)對稱像差,還可以描述非共軸光學系統(tǒng)的波像差特性。研究了基于OAF全視場函數(shù)的靈敏度矩陣法在投影物鏡的計算機輔助裝調(diào)技術(shù)中的應(yīng)用。正交像差函數(shù)不僅很好地建立系統(tǒng)波像差與視場坐標之間的聯(lián)系,還能很好地通過多項式系數(shù)的變化反應(yīng)元件的失調(diào)量大小。以O(shè)AF多項式系數(shù)建立的靈敏度矩陣克服了視場條件的限制,簡化了投影物鏡元件失調(diào)量補償?shù)臄?shù)學模型,降低了補償量的求解難度。在仿真實驗中,運用OAF建立的數(shù)學模型分別求解了投影物鏡在含加工誤差下和不含加工誤差下隨機裝調(diào)誤差的補償量,優(yōu)化投影物鏡在元件失調(diào)情況下的像差,驗證了基于OAF全視場像差優(yōu)化模型的可行性,為實際中投影物鏡裝調(diào)提供理論基礎(chǔ)。
[Abstract]:Projection objective lens is the most core subsystem of lithography machine, its design and manufacture technology is very difficult. Projection objective lens has the characteristics of high NAand large field of view, and requires very high imaging quality. The optical diffraction limit is reached. In the manufacturing process of projection objective lens, the machining tolerance and the adjustment tolerance are also very strict. Therefore, in the design and manufacture of projection objective lens. Image quality evaluation and image quality compensation are very important. Image quality evaluation runs through the design process of projective objective lens and is an important basis for system optimization and image quality compensation. Image quality compensation can ensure the realization of various technical indicators of projection objective lens. In this paper, a new polynomial is introduced to represent the global wave aberration distribution of the projection objective lens, and the aberration characteristics of the related polynomial are analyzed. The full field compensation mathematical model based on the polynomial is applied to the computer-aided adjustment of projection objective lens. This paper aims at the deficiency of Zernike polynomial in describing the comprehensive aberration characteristics of projection objective lens. . Based on the Zernike polynomials, a new polynomial is extended to represent the total field aberration distribution of the projection objective lens, which is called orthogonal aberration function. The distribution of total field aberration of projection objective lens with and without machining error is described by OAF. Comparing and analyzing the accuracy of OAF representation and wave aberration. OAF can classify and quantify the aberration of lithographic objective lens more finely, and can not only describe the rotational symmetry aberration of coaxial optical system. The application of sensitivity matrix method based on OAF full field of view function in the computer-aided adjustment of projection objective lens is studied. The orthogonal aberration function is not only very good, but also can be used to describe the wave aberration characteristics of non-coaxial optical system. The relationship between the system aberration and the field of view coordinates is established. The sensitivity matrix established by OAF polynomial coefficient can overcome the limitation of field of view condition. The mathematical model of offset compensation for projective objective elements is simplified, and the difficulty of solving the compensation is reduced. By using the mathematical model established by OAF, the compensation amount of the random mounting error of projection objective lens with and without machining error is solved, respectively, and the aberration of projection objective lens under the condition of component misalignment is optimized. The feasibility of the optimization model based on OAF full field aberration is verified, which provides a theoretical basis for the actual projection objective.
【學位授予單位】：中國科學院研究生院（光電技術(shù)研究所）
【學位級別】：碩士
【學位授予年份】：2015
【分類號】：TN305.7

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