本文關(guān)鍵詞：極紫外光刻聚光鏡冷卻優(yōu)化及光機(jī)熱分析　出處：《哈爾濱工業(yè)大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

  更多相關(guān)文章： 極紫外/X射線光刻 光源聚光鏡 傳熱模型 冷卻管布局優(yōu)化 形變擬合 光機(jī)集成

【摘要】：光源聚光系統(tǒng)是極紫外光刻機(jī)的重要組成部分。隨著光源功率的提高,聚光系統(tǒng)吸收的熱量也越大。高溫使聚光反射鏡膜層使用壽命降低,鏡體嚴(yán)重?zé)嶙冃?造成極紫外光線在后續(xù)中間焦點(diǎn)處大幅離焦,會(huì)聚光斑尺寸增大且能量分布非均勻性進(jìn)一步加大。照明質(zhì)量的下降最終會(huì)影響光刻質(zhì)量和產(chǎn)量。為減小極紫外光刻聚光鏡由于鏡體溫度差異引起的熱形變,提高聚焦光斑的照明質(zhì)量,本文以激光等離子光源(LPP)與Wolter型聚光系統(tǒng)為研究實(shí)例,對(duì)鏡體背側(cè)冷卻管布局的優(yōu)化進(jìn)行了研究。分析并建立輻射源與鏡體的熱輻射模型,詳細(xì)計(jì)算了鏡體表面的非均勻熱流分布,擬定冷卻管總體布局方案;建立鏡體熱傳導(dǎo)計(jì)算模型,采用冷卻水熱對(duì)流經(jīng)驗(yàn)?zāi)Ｐ?再利用能量守恒關(guān)系式將三者統(tǒng)一到優(yōu)化程序中,以各相鄰冷卻管間距為最終循環(huán)變量,以鏡面溫差范圍最小為優(yōu)化目標(biāo),完成了冷卻管最優(yōu)軸向間距的計(jì)算。結(jié)果表明,針對(duì)具有40kw功率的極紫外光源,聚光系統(tǒng)外層聚光鏡僅在4根回路單管的布局下,利用上述冷卻管間距優(yōu)化方法,可將整個(gè)鏡體溫差控制在1℃范圍內(nèi)。分析過程及優(yōu)化方法可為其他具有非均勻邊界熱流分布的光學(xué)系統(tǒng)反射鏡的主動(dòng)熱控設(shè)計(jì)提供一定參考。為了進(jìn)一步研究鏡體殘余溫差對(duì)聚焦光斑質(zhì)量的影響,本文采用了Zernike環(huán)多項(xiàng)式擬合鏡面變形的方法。根據(jù)ANSYS有限元分析軟件獲得的鏡體變形數(shù)據(jù),擬合得到的Zemike環(huán)多項(xiàng)式系數(shù),用自定義的INT文件將Zernike環(huán)多項(xiàng)式擬合的鏡面變形導(dǎo)入到光學(xué)設(shè)計(jì)軟件CODE V中,得到了鏡面變形對(duì)聚焦光斑質(zhì)量的影響,實(shí)現(xiàn)了光機(jī)集成分析。
[Abstract]:The condensing system of light source is an important part of the extreme ultraviolet lithography machine. With the increase of the power of the light source, the heat absorbed by the condensing system increases. The high temperature reduces the service life of the film layer of the condenser mirror, resulting in the serious thermal deformation of the mirror body. This results in a large defocus of the extreme ultraviolet ray at the subsequent intermediate focal point. The size of the convergent spot increases and the inhomogeneity of the energy distribution increases further. The decrease of illumination quality will eventually affect the lithography quality and output. In order to reduce the thermal deformation caused by the temperature difference of the mirror in the extreme ultraviolet lithography condenser. In order to improve the illumination quality of focusing spot, this paper takes LPP (laser plasma light source) and Wolter type condensing system as examples. The optimization of the collocation of the cooling tube on the back side of the mirror is studied. The thermal radiation model of the radiation source and the mirror body is established, and the non-uniform heat flux distribution on the surface of the mirror is calculated in detail, and the overall layout scheme of the cooling tube is drawn up. The heat conduction calculation model of vitrinite is established. The empirical model of heat convection in cooling water is adopted, and the energy conservation relation is used to unify the three models into the optimization program. The distance between the adjacent cooling tubes is taken as the final cycle variable. The optimum axial distance of cooling tube is calculated with the minimum temperature difference range of mirror surface as the optimization objective. The results show that for the extreme ultraviolet light source with 40kw power. The outer layer condenser of the condensing system is optimized by the above method under the arrangement of only four single tubes. The temperature difference of the mirror can be controlled in the range of 1 鈩，

本文編號(hào)：1390999