離子束濺射氧化物薄膜的中紅外特性研究
發(fā)布時(shí)間:2019-05-28 14:21
【摘要】:中紅外2-6μm波段是紅外探測(cè)器和化學(xué)激光器的主要工作波段之一,應(yīng)用在這一波段的光學(xué)薄膜材料主要是氟化物、硫化物和硒化物等軟膜材料。氧化物具有優(yōu)越的機(jī)械特性和環(huán)境穩(wěn)定性,已廣泛的應(yīng)用于可見(jiàn)近紅外波段,制備高性能光學(xué)薄膜。但是關(guān)于氧化物在中紅外波段的研究及應(yīng)用很少有相關(guān)報(bào)導(dǎo),開(kāi)展這方面的工作,對(duì)拓寬氧化物薄膜的應(yīng)用范圍,解決傳統(tǒng)紅外薄膜材料環(huán)境穩(wěn)定性、附著力差等問(wèn)題,具有重要意義。本文針對(duì)離子束濺射制備的氧化物薄膜在中紅外波段的特性,包括光學(xué)特性、微結(jié)構(gòu)、環(huán)境穩(wěn)定性等進(jìn)行了較為系統(tǒng)的研究,并設(shè)計(jì)制備了中紅外多層高反膜。具體研究?jī)?nèi)容包括以下幾個(gè)方面:1.用離子束濺射方法制備了幾種常用的單層氧化物薄膜,測(cè)試研究了薄膜的中紅外光譜、光學(xué)常數(shù)、表面形貌、應(yīng)力以及環(huán)境穩(wěn)定性等特性。2.比較了色散模型擬合法和K-K變換方法這兩種光學(xué)常數(shù)獲取方法各自的特點(diǎn)和不足之處,將兩種方法相結(jié)合,用擬合透射率代替光譜儀不能測(cè)試的波段范圍,并通過(guò)改變K-K變換中被積函數(shù)的形式,有效提高了K-K方法的計(jì)算精度。3.設(shè)計(jì)并制備了中紅外2.7μm及3.8μm反射膜,測(cè)試并分析了薄膜的光譜特性、斷面結(jié)構(gòu)特性以及退火特性。4.針對(duì)制備的高反膜膜厚不匹配問(wèn)題,提出離子束濺射沉積速率隨時(shí)間緩慢下降的假設(shè),并分別通過(guò)SEM斷面圖像分析方法和透反射率擬合方法,來(lái)探索制備的高反膜中膜層厚鍍隨層數(shù)變化的規(guī)律,兩種方法所得結(jié)果較為一致,理論計(jì)算的光譜和實(shí)測(cè)光譜的吻合程度也大大提高。
[Abstract]:The medium infrared 2-6 渭 m band is one of the main working bands of infrared detector and chemical laser. The optical thin film materials used in this band are mainly soft film materials such as fluoride, sulfide and selenide. Oxide has excellent mechanical properties and environmental stability, and has been widely used in visible near-infrared band to prepare high performance optical thin films. However, there are few reports on the research and application of oxides in the middle infrared band. The work in this field can broaden the application range of oxide thin films and solve the problems of environmental stability and poor adhesion of traditional infrared thin films. It is of great significance. In this paper, the properties of oxide thin films prepared by ion beam sputtering in the middle infrared band, including optical properties, microstructure, environmental stability and so on, have been systematically studied, and the middle infrared multi-layer high reaction films have been designed and prepared. The specific research contents include the following aspects: 1. Several common monolayer oxide thin films were prepared by ion beam sputter. The mid-infrared spectra, optical constant, surface morphology, stress and environmental stability of the films were measured and studied. The characteristics and shortcomings of dispersion model fitting method and K 鈮,
本文編號(hào):2487129
[Abstract]:The medium infrared 2-6 渭 m band is one of the main working bands of infrared detector and chemical laser. The optical thin film materials used in this band are mainly soft film materials such as fluoride, sulfide and selenide. Oxide has excellent mechanical properties and environmental stability, and has been widely used in visible near-infrared band to prepare high performance optical thin films. However, there are few reports on the research and application of oxides in the middle infrared band. The work in this field can broaden the application range of oxide thin films and solve the problems of environmental stability and poor adhesion of traditional infrared thin films. It is of great significance. In this paper, the properties of oxide thin films prepared by ion beam sputtering in the middle infrared band, including optical properties, microstructure, environmental stability and so on, have been systematically studied, and the middle infrared multi-layer high reaction films have been designed and prepared. The specific research contents include the following aspects: 1. Several common monolayer oxide thin films were prepared by ion beam sputter. The mid-infrared spectra, optical constant, surface morphology, stress and environmental stability of the films were measured and studied. The characteristics and shortcomings of dispersion model fitting method and K 鈮,
本文編號(hào):2487129
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