ALD法制備AZO薄膜及光電性質(zhì)研究
[Abstract]:As a wide band gap semiconductor material, zinc oxide has attracted wide attention in recent years. Compared with ITO, zinc oxide is cheap, non-toxic and more stable in air. Zinc oxide n-type conductive film can be doped with aluminum, gallium, indium and other trivalent atoms. Among these elements, aluminum doped zinc oxide is considered to be an electrode for optoelectronic devices due to its good transmittance and low resistivity in the visible and near infrared region. So far, according to our understanding, AZO thin films have been used in organic light emitting diodes and solar cells, but not in organic near infrared detectors. Because of its simple and accurate thickness control, large area, large quantity, good shape preservation and reproducibility, atomic layer deposition method has become an effective semiconductor thin film deposition technology. The films produced by atomic layer deposition are usually compact, void free and have good substrate adaptability. The resistivity of Al-doped zinc oxide films grown by atomic layer deposition can reach 10 ~ (-4) cm ~ (-1). In this paper, diethyl zinc, trimethyl aluminum as the metal precursor of zinc oxide and aluminum trioxide, water as oxygen source, the content of Al prepared by atomic layer deposition on transparent substrates is 1 and 2, respectively. 3% of AZO and ZnO films were characterized by XRD, Hall test, scanning electron microscope and photoluminescence. More importantly, we successfully fabricate the organic near infrared detector on the deposited AZO thin film, which proves that the prepared AZO film is a kind of transparent conductive material which can replace the ITO film.
【學(xué)位授予單位】:長春理工大學(xué)
【學(xué)位級別】:碩士
【學(xué)位授予年份】:2015
【分類號】:TN304.21;TB383.2
【共引文獻(xiàn)】
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相關(guān)碩士學(xué)位論文 前5條
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