【摘要】：氧化鉻因其具有高硬度、高溫穩(wěn)定性、高化學(xué)穩(wěn)定性及抗腐蝕等性能,被廣泛應(yīng)用于冶金、顏料、磨料、耐火材料及新發(fā)展的熔噴涂料等方面。近年來(lái)對(duì)氧化鉻薄膜的研究主要集中在成分結(jié)構(gòu)、機(jī)械性能、摩擦磨損性能與作為太陽(yáng)能選擇吸收薄膜的可行性等。本論文采用脈沖偏壓電弧離子鍍技術(shù)在石英玻璃及硅片上制備鉻的氧化物薄膜,并對(duì)薄膜的成分、結(jié)構(gòu)、力學(xué)性能及光學(xué)性能進(jìn)行研究,以期獲得具有良好力學(xué)性能及光學(xué)性能的氧化鉻薄膜,目的在于能在發(fā)展離子鍍膜工藝技術(shù)的同時(shí),進(jìn)一步豐富可用于表面改性的陶瓷薄膜材料庫(kù)。首先,在僅改變氧氣流量情況下采用脈沖偏壓電弧離子鍍技術(shù)在石英玻璃及(111)單晶硅基片上制備一系列Cr-O薄膜。研究了氧氣流量(40 sccm-200 sccm)對(duì)薄膜表面形貌、結(jié)構(gòu)、硬度及光學(xué)性能的影響。研究結(jié)果表明：采用脈沖偏壓技術(shù)成功制備出了一系列Cr-O薄膜；所得薄膜表現(xiàn)出良好的表面質(zhì)量；薄膜中各元素的含量基本保持相對(duì)穩(wěn)定。薄膜的硬度均在19.0 GPa以上,并且在氧氣流量為160 sccm時(shí)達(dá)到最大值24.8GPa；當(dāng)氧氣流量為80 sccm時(shí)所得薄膜表現(xiàn)出良好的透光率,最大值為71%；其光學(xué)帶隙也達(dá)到了最大值1.81 eV。其次,在不同偏壓幅值下采用脈沖偏壓電弧離子鍍技術(shù)在石英玻璃及(111)單晶硅基片上制備了均勻透明Cr-O薄膜。研究了偏壓幅值(0～0500 V)對(duì)薄膜表面形貌、結(jié)構(gòu)、硬度及光學(xué)性能的影響。研究結(jié)果表明：制得薄膜均具有良好的表面質(zhì)量,且隨偏壓幅值的增大薄膜表面質(zhì)量有明顯提高；當(dāng)施加偏壓時(shí)薄膜中出現(xiàn)晶化相,且隨著偏壓幅值的增加,其相結(jié)構(gòu)由Cr203相向CrO相轉(zhuǎn)變；薄膜硬度先增大后減小,負(fù)偏壓為-300 V時(shí),硬度達(dá)到最大值24.4 GPa；制得薄膜表現(xiàn)出良好的光學(xué)性能,最高可達(dá)72%,隨偏壓幅值增大薄膜吸收邊先紅移后藍(lán)移,當(dāng)負(fù)偏壓為-200 V時(shí)薄膜光學(xué)帶隙達(dá)到最大值1.88 eV。
[Abstract]:Because of its high hardness, high temperature stability, high chemical stability and corrosion resistance, chromium oxide is widely used in metallurgy, pigments, abrasives, refractories and newly developed meltblown coatings. In recent years, the study of chromium oxide thin films is mainly focused on the composition, mechanical properties, friction and wear properties and the feasibility of selective absorption of solar energy. In this paper, chromium oxide thin films were prepared on quartz glass and silicon substrates by pulsed bias arc ion plating. The composition, structure, mechanical properties and optical properties of the films were studied. In order to obtain chromium oxide thin film with good mechanical and optical properties, the aim is to enrich the ceramic thin film material library which can be used for surface modification while developing the technology of ion plating. Firstly, a series of Cr-O thin films were prepared on quartz glass and (111) silicon substrates by pulsed bias arc ion plating under the condition of only changing oxygen flow rate. The effects of oxygen flow rate (40 sccm-200 sccm) on the surface morphology, structure, hardness and optical properties of the films were investigated. The results show that a series of Cr-O thin films have been successfully prepared by pulse bias technique. The films show good surface quality and the contents of various elements in the films are relatively stable. The hardness of the films is above 19.0 GPa, and the maximum value is 24.8 GPA at the oxygen flow rate of 160 sccm, the film exhibits a good transmittance when the oxygen flow rate is 80 sccm, and the maximum optical band gap reaches the maximum value of 1.81 eV.. Secondly, uniform transparent Cr-O thin films were prepared on quartz glass and (111) silicon substrates by pulsed bias arc ion plating at different bias voltages. The effects of bias amplitude (0500 V) on the surface morphology, structure, hardness and optical properties of the films were investigated. The results show that all the films have good surface quality, and the surface quality of the films increases obviously with the increase of the bias amplitude, and the crystalline phase appears in the films when the bias voltage is applied, and increases with the increase of the bias voltage amplitude. The phase structure of the film changes from Cr203 phase to CrO phase, and the hardness of the film increases first and then decreases. When the negative bias voltage is -300V, the hardness reaches the maximum value of 24.4 GPa; and the film exhibits good optical properties. The maximum value is 72. With the increase of bias amplitude, the absorption edge shifts first and then the blue shift. When the negative bias voltage is -200V, the optical band gap of the film reaches the maximum value of 1.88 eV..
【學(xué)位授予單位】：大連理工大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類(lèi)號(hào)】：TB306

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本文編號(hào)：2228773