【摘要】：非晶合金薄膜最早是以蒸發(fā)沉積的方法被發(fā)現(xiàn)的,真空蒸發(fā)法制備非晶薄膜具有無需制備靶材、工藝簡單、薄膜純度高等優(yōu)點(diǎn)。然而目前采用真空蒸發(fā)法制備非晶合金薄膜的研究工作很少。由于Zr基非晶薄膜具有良好的玻璃形成能力和熱穩(wěn)定性,且Zr-Cu組元是典型的二元非晶合金體系,Zr-Cu-Ga組元非晶合金薄膜的制備與研究目前并沒有研究報(bào)道過。鑒于此,本文采用電子束與電阻復(fù)合蒸發(fā)法制備Zr-Cu、Zr-Cu-Ga組元非晶薄膜,其中Zr由電子束蒸發(fā)源蒸鍍,Cu和Ga由電阻蒸發(fā)源蒸鍍,襯底基板無冷卻裝置。對于Zr-Cu組元薄膜,本文研究了所制備Zr-Cu組元薄膜的玻璃形成成分范圍、熱穩(wěn)定性以及形貌特點(diǎn),且探討了樣品沉積時(shí)間對薄膜結(jié)構(gòu)、熱穩(wěn)定性、厚度、形貌、表面粗糙度、光學(xué)性能以及電學(xué)性能的影響。結(jié)果顯示,該復(fù)合蒸發(fā)鍍膜技術(shù)能夠方便地制備玻璃形成成分范圍寬的ZrxCu100-x非晶薄膜(x=30-85at%),但沒有明顯的玻璃轉(zhuǎn)變現(xiàn)象且晶化溫度偏低。另外,薄膜的結(jié)構(gòu)與性能對沉積時(shí)間比較敏感。隨著沉積時(shí)間的延長,樣品從非晶結(jié)構(gòu)逐漸向非晶納米晶復(fù)合結(jié)構(gòu)轉(zhuǎn)變；樣品表面形貌從光滑表面逐漸向較大尺寸的“團(tuán)簇”形貌轉(zhuǎn)變。樣品表面粗糙度和電阻率隨沉積時(shí)間的延長呈減小趨勢,但樣品的反射率呈增大趨勢。對于Zr-Cu-Ga組元薄膜,本文研究了Ga含量對Zr-Cu-Ga薄膜結(jié)構(gòu)、熱穩(wěn)定性、形貌以及電學(xué)性能的影響。結(jié)果顯示,Zr-Cu-Ga薄膜的玻璃形成成分范圍相比于同組元的塊體和帶材非晶樣品較寬。本文所獲得的Zr-Cu-Ga非晶薄膜沒有明顯的玻璃轉(zhuǎn)變現(xiàn)象且表面呈孤立的“顆粒狀”形貌。
[Abstract]:Amorphous alloy thin films were first discovered by evaporation deposition. The preparation of amorphous films by vacuum evaporation has the advantages of no target preparation, simple process, high purity and so on. However, there is little research on the preparation of amorphous alloy thin films by vacuum evaporation. Due to the good glass forming ability and thermal stability of Zr based amorphous films, the preparation and study of Zr-Cu-Ga component amorphous alloy films have not been reported at present, and the Zr-Cu component is a typical binary amorphous alloy system. In this paper, Zr-Cu,Zr-Cu-Ga component amorphous films were prepared by the composite evaporation of electron beam and resistor, in which Zr was evaporated by electron beam evaporation source, Cu and Ga were evaporated by resistance evaporation source, and there was no cooling device on the substrate. For Zr-Cu component films, the glass composition range, thermal stability and morphology characteristics of the prepared Zr-Cu component films were studied, and the effects of sample deposition time on the structure, thermal stability, thickness, morphology, surface roughness of the films were discussed. The influence of optical properties and electrical properties. The results show that the composite evaporative coating technique can easily fabricate glass amorphous ZrxCu100-x films with a wide range of composition (x _ (30) ~ (85) at%), but there is no obvious glass transition and the crystallization temperature is on the low side. In addition, the structure and properties of the films are sensitive to deposition time. With the prolongation of deposition time, the sample changed from amorphous structure to amorphous nanocrystalline composite structure, and the surface morphology of the sample gradually changed from smooth surface to larger "cluster" morphology. The surface roughness and resistivity of the samples decreased with the increase of deposition time, but the reflectivity of the samples increased. The effects of Ga content on the structure, thermal stability, morphology and electrical properties of Zr-Cu-Ga thin films were investigated. The results show that the glass forming composition range of Zr-Cu-Ga thin film is wider than that of bulk and strip amorphous samples. The amorphous Zr-Cu-Ga films obtained in this paper have no obvious glass transition phenomenon and have isolated "granular" morphology on the surface.
【學(xué)位授予單位】：合肥工業(yè)大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TB383.2

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