【摘要】：CrN、CrAlN、CrAlSiN等過(guò)渡金屬氮化物薄膜是應(yīng)用廣泛的硬質(zhì)薄膜材料,由于其具有硬度高、耐磨性好、抗氧化能力強(qiáng)等優(yōu)異的性能,在刀具、裝飾材料、模具、生物、航空等方面有大量的應(yīng)用。本文采用磁控濺射法制備了CrN、CrAlN、CrAlSiN三種薄膜,系統(tǒng)地研究了Al靶功率對(duì)CrAlN薄膜微觀結(jié)構(gòu)、表面形貌、化學(xué)成分及力學(xué)性能的影響,研究了Si靶功率、真空及大氣熱處理溫度對(duì)CrAlSiN薄膜微觀結(jié)構(gòu)、表面形貌、化學(xué)成分及力學(xué)性能的影響。分別使用掃描電子顯微鏡(SEM)、X射線衍射儀(XRD)和納米壓痕儀等設(shè)備對(duì)薄膜的表面形貌、成分、微觀結(jié)構(gòu)、硬度進(jìn)行表征。隨著Al靶功率的增大,CrAlN薄膜中Al元素含量逐漸升高,薄膜的硬度和彈性模量升高,此時(shí)薄膜(200)衍射峰增強(qiáng),衍射峰峰位右移,同時(shí)薄膜表面缺陷減少,粗糙度減少,表面不斷趨于致密化。隨著Si靶功率的增大,CrAlSiN薄膜中Si元素含量不斷增加,Cr和Al元素含量相對(duì)減少,薄膜硬度先大幅下降,后逐漸平穩(wěn),晶粒沿(200)表面能最小的方向生長(zhǎng)。Si的加入并沒(méi)有形成衍射峰,而是以Si3N4非晶形式存在晶界處而阻礙CrAlN柱狀晶的生長(zhǎng)從而細(xì)化晶粒,使薄膜晶體尺寸變小。800℃真空熱處理后,CrAlSiN薄膜表面出現(xiàn)少量裂紋,薄膜仍保持面心立方結(jié)構(gòu),薄膜硬度和彈性模量少量下降。當(dāng)真空熱處理溫度升到900℃和1000℃時(shí),薄膜表面出現(xiàn)大量的網(wǎng)狀裂紋,薄膜面心立方結(jié)構(gòu)消失。隨著真空熱處理溫度從800℃升高到1000℃,薄膜中的Cr,Si元素含量不斷下降,Al元素含量保持穩(wěn)定,相對(duì)的Fe元素含量逐漸升高。CrAlSiN薄膜在800℃時(shí)大氣熱處理后,薄膜基本保持面心立方結(jié)構(gòu),沒(méi)有氧化峰的出現(xiàn),抗氧化性能良好。1000℃大氣熱處理后,CrAlSiN薄膜表面已經(jīng)大面積出現(xiàn)大尺寸晶粒,薄膜CrAlN立方結(jié)構(gòu)的峰已消失,同時(shí)Cr,Al,Fe的氧化峰開(kāi)始出現(xiàn),薄膜整體結(jié)構(gòu)崩潰。
[Abstract]:The transition metal nitride films such as CrNU, CrAlN and CrAlSiN are widely used hard film materials. Because of their excellent properties such as high hardness, good wear resistance, strong oxidation resistance and so on, they are widely used in cutting tools, decorative materials, molds, biology, etc. Aviation and other areas have a large number of applications. In this paper, three kinds of CrNU CrAlN thin films were prepared by magnetron sputtering. The effects of Al target power on the microstructure, surface morphology, chemical composition and mechanical properties of CrAlN thin films were systematically studied, and the Si target power was studied. Effects of vacuum and atmospheric heat treatment temperature on microstructure, surface morphology, chemical composition and mechanical properties of CrAlSiN thin films. The surface morphology, composition, microstructure and hardness of the films were characterized by scanning electron microscope (SEM) X-ray diffraction (XRD) and nano-indentation. With the increase of Al target power, the Al content in CrAlN film increases gradually, and the hardness and elastic modulus of the film increase. At this time, the diffraction peak of the film (200) increases, the diffraction peak shifts to the right, and the surface defect decreases and the roughness decreases. The surface tends to be densified. With the increase of Si target power, the content of Si element in CrAlSiN thin film decreases relatively, the hardness of the film decreases at first and then becomes stable. The addition of Si along the direction of the minimum surface energy of (200) does not form a diffraction peak. However, the amorphous form of Si _ 3N _ 4 exists at the grain boundary, which hinders the growth of CrAlN columnar crystals and refines the grain size. After vacuum heat treatment at .800 鈩，

本文編號(hào)：2121828