摻W類金剛石薄膜的高溫摩擦學(xué)行為
發(fā)布時間:2018-05-12 00:14
本文選題:摻雜 + 類金剛石薄膜 ; 參考:《摩擦學(xué)學(xué)報》2017年03期
【摘要】:采用陽極層流型離子源結(jié)合非平衡磁控濺射技術(shù)制備了含氫摻鎢類金剛石(W-DLC)薄膜,利用TEM、SEM、XRD、Raman光譜儀和摩擦磨損試驗機(jī)等方法分析了薄膜的結(jié)構(gòu)、形貌以及在高溫下的摩擦學(xué)性能,探討了W-DLC薄膜在高溫下摩擦磨損行為作用機(jī)理.結(jié)果表明:W-DLC薄膜中鎢原子以WC1-x納米晶團(tuán)簇的形式隨機(jī)分布于碳基質(zhì)中,增強(qiáng)了薄膜的韌性.W-DLC薄膜在25~200℃范圍內(nèi)的摩擦系數(shù)可穩(wěn)定在0.1以下,在300℃時的摩擦系數(shù)則高達(dá)0.5,當(dāng)試驗溫度進(jìn)一步升高到400℃時,薄膜的摩擦系數(shù)反而降低至0.3左右,當(dāng)試驗溫度升高到500℃時,W-DLC薄膜中的W被氧化生成WO_3和摩擦誘導(dǎo)生成的石墨共同作用,使得薄膜的摩擦系數(shù)降到0.15左右,說明W-DLC薄膜在高溫下仍然具有優(yōu)異的減摩特性.然而,W-DLC薄膜的磨損率在25~500℃范圍內(nèi)表現(xiàn)出隨著溫度的升高而不斷增大的趨勢.
[Abstract]:W-DLC thin films containing hydrogen were prepared by anodic laminar ion source and unbalanced magnetron sputtering. The structure, morphology and tribological properties of the films at high temperature were analyzed by means of Tem SEMX XRDX Raman spectrometer and friction and wear tester. The mechanism of friction and wear behavior of W-DLC films at high temperature was discussed. The results show that tungsten atoms are randomly distributed in carbon matrix in the form of WC1-x nanocrystalline clusters in the W W DLC film, and the friction coefficient of the W DLC film can be stabilized below 0. 1 at 25 ~ 200 鈩,
本文編號:1876265
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