本文選題：FTO薄膜 + 超聲噴霧熱解法　； 參考：《燕山大學(xué)》2015年碩士論文

【摘要】：本文以單丁基三氯化錫(簡稱MBTC)為前驅(qū)物,氟化銨為摻雜劑,采用超聲噴霧熱解法,在加熱的載玻片上制備摻氟氧化錫薄膜。通過改變基板溫度,噴涂時(shí)間,前驅(qū)物MBTC濃度,分析其對FTO薄膜微觀形態(tài)以及光電性能的影響,本實(shí)驗(yàn)分別采用X射線衍射儀測定并分析薄膜晶化程度和擇優(yōu)生長等結(jié)構(gòu)特點(diǎn);采用冷場發(fā)射掃描電鏡觀察薄膜表面形貌與斷面形貌,并分析薄膜顆粒形狀、尺寸以及膜厚的變化;采用原子力顯微鏡觀察FTO薄膜表面顆粒的起伏情況及三維形貌,分析薄膜表面粗糙度的變化;采用紫外-可見光分光光度計(jì)及方阻儀分別測定薄膜在可見光范圍內(nèi)的平均透射比和方塊電阻,并引用品質(zhì)因數(shù)對薄膜的光電性能作出綜合評價(jià);采用霧度儀測定薄膜在可見光范圍內(nèi)的霧度值,并進(jìn)一步探究薄膜霧度隨晶體結(jié)構(gòu)與表面形貌的變化規(guī)律。實(shí)驗(yàn)結(jié)果表明:不同實(shí)驗(yàn)條件下制備的FTO薄膜均為多晶四方金紅石結(jié)構(gòu)SnO2。隨基板溫度的升高,薄膜的擇優(yōu)取向由(200)晶面轉(zhuǎn)變?yōu)?301)晶面。薄膜厚度、表面顆粒尺寸和表面粗糙度則隨著基板溫度和前驅(qū)物MBTC濃度的升高先增大后減小,隨噴涂時(shí)間的增加而不斷增大。當(dāng)薄膜厚度、表面顆粒尺寸和表面粗糙度分別為1480 nm、539 nm和54.98 nm時(shí),霧度值最大,達(dá)到36.79%。綜合考慮薄膜的光電性能以及霧度,得到絨面FTO薄膜的最佳制備條件為基板溫度530°C、噴涂時(shí)間5 min和MBTC濃度1.5 mol%,在該條件下薄膜的品質(zhì)因數(shù)和霧度分別為21.8×10-3Ω-1和12.66%。
[Abstract]:In this paper, tin fluoride doped tin oxide thin films were prepared on heated glass by ultrasonic spray pyrolysis with MBTCc as precursor and ammonium fluoride as dopant. By changing the substrate temperature, spraying time and MBTC concentration of precursor, the influence of the film on the microstructure and optoelectronic properties of FTO film was analyzed. The crystallization degree and preferential growth of the film were measured and analyzed by X-ray diffraction. The surface morphology and cross-section morphology of FTO films were observed by cold field emission scanning electron microscopy (SEM), and the changes of particle shape, size and film thickness were analyzed, and the undulation and 3D morphology of FTO films were observed by atomic force microscope (AFM). The change of surface roughness is analyzed, the average transmittance and square resistance in visible range are measured by UV-Vis spectrophotometer, and the photoelectric properties of the films are evaluated by using quality factor. The foggy values of the thin films in the visible range were measured by a foggy meter, and the variation of the foggy with the crystal structure and the surface morphology of the films was further investigated. The experimental results show that the FTO films prepared under different experimental conditions are all polycrystalline tetragonal rutile Sno _ 2. With the increase of substrate temperature, the preferred orientation of the film changes from the crystal plane of 200 to the crystal plane of 301. The film thickness, surface particle size and surface roughness increase firstly and then decrease with the increase of substrate temperature and precursor MBTC concentration, and increase with the increase of spraying time. When the film thickness, surface particle size and surface roughness are 1480 nm and 54.98 nm, respectively, the maximum haze value is 36.79 nm. Considering the optoelectronic properties and fogging of the films, the optimum preparation conditions were obtained as follows: substrate temperature 530 擄C, spray time 5 min and MBTC concentration 1.5 mol. The film quality factor and fogging degree were 21.8 脳 10 ~ (-3) 惟 -1 and 12.66 cm ~ (-1), respectively.
【學(xué)位授予單位】：燕山大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TB383.2

【參考文獻(xiàn)】

相關(guān)期刊論文 前4條

1 劉宏燕;顏悅;望詠林;伍建華;張官理;厲蕾;;透明導(dǎo)電氧化物薄膜材料研究進(jìn)展[J];航空材料學(xué)報(bào);2015年04期

2 賴新宇;姜宏;趙會峰;魯鵬;;在線化學(xué)氣相沉積法制備霧度可控的SnO_2:F薄膜[J];硅酸鹽學(xué)報(bào);2013年12期

3 張志海;史成武;孫嵩泉;吳玉程;;溶液組成對噴霧熱解法制備氟摻雜二氧化錫導(dǎo)電薄膜性能的影響[J];硅酸鹽學(xué)報(bào);2010年01期

4 楊建廣,唐謨堂,唐朝波,楊聲海,張保平;銻摻雜二氧化錫薄膜的導(dǎo)電機(jī)理及其理論電導(dǎo)率[J];微納電子技術(shù);2004年04期

，

本文編號：1875495