本文選題：碳納米管 + 電接觸性能　； 參考：《現(xiàn)代化工》2017年10期

【摘要】：以基于CNT的微納電子器件為基礎(chǔ),綜述了近年來(lái)改善CNT與金屬電極間電接觸性能的研究進(jìn)展,闡述了各種改善CNT與金屬電極間電接觸性能方法的原理和優(yōu)缺點(diǎn)。通過(guò)超聲波焊接處理、金屬顆粒黏結(jié)、碳纖維輔助組裝、包覆CNT等處理工藝,可以獲得閾值電壓低、發(fā)射電流密度高和穩(wěn)定性好的CNT場(chǎng)發(fā)射器;采用原子層沉積法、溶液處理法、超聲波焊接法、高溫退火法等可以很好地改善CNT與金屬電極間的電接觸性能,進(jìn)而提高CNT晶體管的遷移率、跨導(dǎo)率和通斷電流比;化學(xué)機(jī)械拋光、電子束誘導(dǎo)沉積等處理工藝可以增加CNT和金屬電極的接觸面積,降低兩者間的接觸電阻,從而實(shí)現(xiàn)高承載電流的CNT互連線。
[Abstract]:Based on the micro / nano electronic devices based on CNT, the research progress of improving the electrical contact performance between CNT and metal electrodes in recent years is reviewed. The principle, advantages and disadvantages of various methods to improve the electrical contact performance between CNT and metal electrodes are described. The CNT field emitters with low threshold voltage, high emission current density and good stability can be obtained by ultrasonic welding, metal particle bonding, carbon fiber auxiliary assembly and CNT coating. Solution treatment, ultrasonic welding, high temperature annealing can improve the electrical contact performance between CNT and metal electrodes, and then improve the mobility, transconductance and on-off current ratio of CNT transistors. The electron beam induced deposition process can increase the contact area between CNT and metal electrode and reduce the contact resistance between them, so that the CNT interconnection with high load current can be realized.
【作者單位】： 華北理工大學(xué)機(jī)械工程學(xué)院;
【基金】：國(guó)家自然科學(xué)基金項(xiàng)目(51472074,51172062) 河北省百人計(jì)劃項(xiàng)目(E2012100005) 華北理工大學(xué)研究生創(chuàng)新項(xiàng)目(2017S26)
【分類(lèi)號(hào)】：TB383.1;TQ127.11

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