本文選題：磁控濺射 + 電阻蒸發(fā)　； 參考：《四川師范大學》2015年碩士論文

【摘要】：Ag薄膜由于其優(yōu)良的光電性質及廣泛的應用前景而備受科研工作者的關注。近幾年,納米金屬Ag材料的表面等離子體激元(SPP)由于其獨特的光學特性,更是成為了當前的重要研究課題。傳統(tǒng)的光學成像因受衍射極限的存在的限制,導致光學成像分辨率最大只能達到入射光波長的二分之一。為了突破衍射極限從而實現(xiàn)超衍射光學成像,國內外科研工作者提出了超透鏡器件來實現(xiàn)這一目標。而作為超透鏡器件重要組成部分的Ag薄膜也成為眾多學者研究的對象。實現(xiàn)超透鏡器件,需要解決好幾項關鍵技術,透鏡器件重要組成部分的Ag薄膜表面粗糙度就是其中之一。本文以此為研究對象,研究制備工藝對Ag膜表面粗糙度的影響及理論模擬Ag膜表面粗糙度對透鏡器件成像的影響。研究的主要內容和結果如下:1.運用理論仿真模擬軟件,研究Ag膜表面粗糙度在超透鏡器件中的作用和影響。發(fā)現(xiàn)隨著銀層的粗糙度的增加,成像質量的對比度逐漸降低;當RMS等于零(理想情況)時,其成像質量的對比度為0.93,當RMS增加到2.6 nm時,成像質量的對比度降到0.6。2.采用蒸發(fā)法和磁控濺射兩種方法制備了Ag薄膜,系統(tǒng)研究了Ag薄膜的表面形貌性質。為改進超透鏡器件中Ag薄膜表面粗糙度提供了依據(jù)。3.研究在磁控濺射制備的Ag膜,濺射功率和濺射壓強對Ag膜沉積速率和表面粗糙度影響。發(fā)現(xiàn)用磁控濺射方法改變工藝參數(shù),RMS可從5.0 nm減小到1.1nm。在相同濺射功率下,濺射氣壓從1.0 Pa升到3.0 Pa,Ag膜沉積速率和表面粗糙度隨濺射氣壓增大呈減小趨勢。4.研究在電阻蒸發(fā)條件下,加入Cu種子層對Ag膜表面粗糙度、粒徑大小和Sk和Ku等參數(shù)的影響。
[Abstract]:Due to its excellent photoelectric properties and wide application prospects, Ag thin films have attracted the attention of researchers. In recent years, the surface plasmon excitation (SPP) of nanometallic Ag materials has become an important research topic due to its unique optical properties. Due to the limitation of diffraction limit, the resolution of traditional optical imaging can only reach 1/2 of the incident wavelength. In order to break through the diffraction limit and realize the hyperdiffractive optical imaging, researchers at home and abroad have proposed a hyper lens device to achieve this goal. As an important part of hyper lens devices, Ag thin films have been studied by many scholars. The surface roughness of Ag thin film is one of the most important components of lens devices. In this paper, the effect of preparation process on the surface roughness of Ag film and the influence of surface roughness of Ag film on the imaging of lens devices are studied. The main contents and results of the study are as follows: 1. The effect of surface roughness of Ag film on superlens devices is studied by using theoretical simulation software. It is found that the contrast of the imaging quality decreases with the increase of the roughness of the silver layer, and the contrast of the imaging quality decreases to 0.6.2 when the RMS is equal to zero (ideally), and the contrast of the imaging quality decreases to 0.6.2 when the RMS increases to 2.6 nm. The Ag thin films were prepared by evaporation and magnetron sputtering. The surface morphology of Ag thin films was studied systematically. It provides a basis for improving the surface roughness of Ag thin films in hyper lens devices. The effects of sputtering power and sputtering pressure on the deposition rate and surface roughness of Ag films prepared by magnetron sputtering were studied. It is found that the RMS can be reduced from 5.0 nm to 1.1 nm by magnetron sputtering. At the same sputtering power, the deposition rate and surface roughness of Ag films increased from 1.0 Pa to 3.0 Pa and the surface roughness decreased with the increase of sputtering pressure. The effects of Cu seed layer on the surface roughness, particle size, Sk and Ku of Ag film were studied under the condition of resistance evaporation.
【學位授予單位】：四川師范大學
【學位級別】：碩士
【學位授予年份】：2015
【分類號】：TB383.2

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