本文選題：化學(xué)氣相沉積 + 金剛石粉體　； 參考：《表面技術(shù)》2017年02期

【摘要】：目的增強金剛石與基體的界面結(jié)合能力。方法首先對金剛石粉體進行"除有機物→除油→粗化→烘干"處理。采用自制化學(xué)氣相沉積裝置,研究了以H_2和WF_6為反應(yīng)氣體在金剛石表面CVD法鍍覆鎢工藝。使用掃描電鏡(SEM)、能譜(EDS)、X射線衍射(XRD)、透射電鏡(SEM)等檢測方法,分析了金剛石粉體鍍層鎢的微觀形貌、成分、組織結(jié)構(gòu),對鍍層包覆金剛石粉體相關(guān)性能進行了初步測試。結(jié)果在粒徑約為223.6mm的金剛石表面獲得均勻致密鍍覆層的最佳工藝參數(shù)為:沉積溫度670℃,沉積時間2 min,H_2通入量1 L/min,WF_6消耗量2 g/min。沉積溫度為580℃時,獲得的均勻致密鎢鍍層的厚度為150 nm,且鍍層雜質(zhì)含量較少。將鍍覆鎢的金剛石和普通金剛石分別與銅粉熱壓燒結(jié)后進行抗彎強度測試,結(jié)果顯示含鍍覆鎢的金剛石試樣抗彎強度提高了38.6%。加入鍍鎢金剛石壓塊的熱膨脹系數(shù)比加入普通金剛石的有所降低,并且加入的鍍鎢金剛石粉體越多,壓塊的熱膨脹系數(shù)越低。結(jié)論鍍鎢后的金剛石顆粒的表面性能得到改善,與基體的結(jié)合能力得到提高。
[Abstract]:Objective to enhance the interfacial bonding ability of diamond and matrix. Methods the diamond powder was first treated by "coarsening and drying of organic matter." A self-made chemical vapor deposition device was used to study the process of tungsten plating on diamond surface by CVD method using Hs2 and WF_6 as reaction gases. Scanning electron microscopy (SEM), EDS-X ray diffraction (XRD) and transmission electron microscopy (TEM) were used to analyze the microstructure, composition, microstructure and properties of diamond coated diamond powder. Results the optimum process parameters for obtaining uniform and compact coating on diamond surface with diameter about 223.6mm are as follows: deposition temperature 670 鈩，

本文編號：1792362