本文選題：三氧化鎢薄膜電極　切入點(diǎn)：氫氧化鎳　出處：《上海師范大學(xué)》2015年碩士論文

【摘要】：近年來(lái)半導(dǎo)體光催化劑在能源和環(huán)境中的應(yīng)用發(fā)展迅速,目前已有大量相關(guān)文獻(xiàn)報(bào)道WO3半導(dǎo)體材料,但WO3自身存在一些缺點(diǎn)如禁帶寬度相對(duì)較窄,使其在實(shí)際中的應(yīng)用受到限制。為了克服或者降低WO3本身的缺陷,需要對(duì)WO3進(jìn)行修飾。因此本論文分別采用添加Ni(OH)2催化劑,制備FTO/WO3/Bi VO4復(fù)合膜和對(duì)WO3薄膜的表面形貌進(jìn)行改善的方法對(duì)WO3薄膜進(jìn)行改性,初步研究了它們的光電化學(xué)性能。本論文研究分為三個(gè)部分:(1)FTO/WO3/N i(OH)2薄膜光電極的制備及其光電化學(xué)和光電催化性能研究。通過(guò)簡(jiǎn)單的溶膠凝膠-浸漬法,經(jīng)過(guò)高溫退火后制備出FTO/WO3/Ni(OH)2光電極。產(chǎn)物經(jīng)XRD、SEM、DRS、Raman、CV等方法表征。通過(guò)該實(shí)驗(yàn),我們發(fā)現(xiàn)不修飾Ni(OH)2的裸露三氧化鎢電極幾乎沒(méi)有光電催化葡萄糖的效果;在三氧化鎢薄膜的表面修氫氧化亞鎳能夠增強(qiáng)三氧化鎢薄膜的光電效應(yīng)。(2)FTO/WO3/Bi VO4薄膜光電極的制備及其光電化學(xué)和光電催化性能研究。本文采用了比較簡(jiǎn)便的溶膠-凝膠法方法:滴涂-煅燒-滴涂-煅燒的方法合成了FTO/WO3/Bi VO4復(fù)合膜。通過(guò)XRD,DRS,SEM和拉曼的表征方法,對(duì)復(fù)合膜和純WO3和純Bi VO4薄膜進(jìn)行了比較,進(jìn)而也對(duì)這三種光電極的光電化學(xué)性質(zhì)進(jìn)行了比較。實(shí)驗(yàn)結(jié)果為FTO/WO3/Bi VO4復(fù)合膜電極在光解水反應(yīng)中電流最大。(3)多空FTO/WO3薄膜光電極的制備及其光電化學(xué)和光電催化性能研究。本文中我們使用了一種簡(jiǎn)單的硬模板法一步制得了多孔三氧化鎢光電極用于光解水的實(shí)驗(yàn)。通過(guò)XRD,DRS,SEM,拉曼和電化學(xué)性質(zhì)的測(cè)試我們得出當(dāng)硬膜板介空碳的百分含量為10%時(shí),我們制得的三氧化鎢薄膜光電極具有較好的光電化學(xué)性質(zhì)。
[Abstract]:The application of semiconductor photocatalysts in energy and environment has developed rapidly in recent years. At present, WO3 semiconductor materials have been reported in a large number of related literatures. However, WO3 itself has some disadvantages, such as relatively narrow band gap.Its application in practice is limited.In order to overcome or reduce the defects of WO3 itself, it is necessary to modify WO3.Therefore, in this thesis, the FTO/WO3/Bi VO4 composite films were prepared by adding Ni(OH)2 catalysts and the surface morphology of WO3 films was improved. The photochemical properties of WO3 films were preliminarily studied.This thesis is divided into three parts: the preparation of the photoelectrode of FTO / WO _ 3 / N i(OH)2 thin film and its photochemical and photocatalytic properties.A simple sol-gel impregnation method was used to prepare FTO/WO3/Ni(OH)2 photoelectrode after high temperature annealing.The product was characterized by the method of XRDX SEMN DRSX Ramanbutae CV and so on.Through this experiment, we found that bare tungsten trioxide electrode without modification of Ni(OH)2 has little photocatalytic effect on glucose.The modification of nickel hydroxide on the surface of tungsten trioxide film can enhance the photoelectric effect of tungsten trioxide thin film. The preparation of photoelectrode and its photochemical and photocatalytic properties of VO4 thin film with FTO / WO _ 3 / Bi have been studied.In this paper, the FTO/WO3/Bi VO4 composite membrane was synthesized by a simple sol-gel method: drop coating, calcination, drop coating and calcination.The photochemical properties of the composite films were compared with those of pure WO3 films and pure Bi VO4 films by means of XRD DDS SEM and Raman spectroscopy, and the photochemical properties of the three photoelectrodes were also compared.The experimental results show that the photoelectrode of FTO/WO3/Bi VO4 composite membrane electrode has the largest current in the photodissociation of water, and the photoelectrochemical and photocatalytic properties of the FTO/WO3 film photoelectrode are studied.In this paper, we use a simple hard template method to prepare porous tungsten trioxide photoelectrode for photolysis of water.Based on the measurements of the XRDX DRSU SEM, Raman and electrochemical properties, we have obtained that the photoelectrode of tungsten trioxide film has good photochemical properties when the content of meso-carbon in the hard plate is 10%.
【學(xué)位授予單位】：上海師范大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：O643.36;TB383.2

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本文編號(hào)：1705977