面向紅外光源的輻射自增強非晶碳薄膜性能
發(fā)布時間:2018-03-12 06:52
本文選題:非晶碳 切入點:紅外光源 出處:《微納電子技術(shù)》2017年06期 論文類型:期刊論文
【摘要】:為進一步提升紅外氣體傳感器的性能,提出了一種可實現(xiàn)輻射自增強的多層納米交疊復(fù)合非晶碳薄膜材料應(yīng)用于紅外光源,對材料制備的關(guān)鍵工藝及性能表征進行了深入研究,以期大幅提高光源的輻射效率,降低功耗。采用非平衡磁控濺射工藝制備了含鈦的周期性非晶碳復(fù)合薄膜,在不同退火條件下進行了方阻及光學(xué)吸收率測試表征。結(jié)果表明,多層納米厚度交疊薄膜有效降低了薄膜的應(yīng)力;氧等離子體表面刻蝕調(diào)控工藝實現(xiàn)了高輻射率納米纖維材料的集成制備;制備的非晶碳納米復(fù)合薄膜在高溫800℃退火后呈現(xiàn)出良好的電阻熱穩(wěn)定性,在波長5~6μm內(nèi)吸收率大于80%,最高接近84%。本工作為該輻射自增強的非晶碳薄膜應(yīng)用于MEMS紅外光源提供了一定的技術(shù)支持。
[Abstract]:In order to further improve the performance of infrared gas sensor, a multi-layer nanocomposite amorphous carbon film material which can realize self-enhancement of radiation was proposed for infrared light source. The key technology and performance characterization of the material were studied. In order to improve the radiation efficiency of the light source and reduce the power consumption, the periodic amorphous carbon composite thin films containing titanium were prepared by unbalanced magnetron sputtering, and the square resistance and optical absorptivity were measured and characterized under different annealing conditions. The multi-layer nano-thickness overlapped film can effectively reduce the stress of the film, and the surface etching control technology of oxygen plasma can realize the integrated preparation of high emissivity nano-fiber material. The amorphous carbon nanocomposite films showed good thermal resistance after annealing at 800 鈩,
本文編號:1600433
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