本文選題：CFUBMS　切入點(diǎn)：DLC　出處：《哈爾濱工業(yè)大學(xué)》2015年碩士論文　論文類型：學(xué)位論文

【摘要】：類金剛石(DLC)碳膜因具有高的硬度、高耐化學(xué)腐蝕性以及低的摩擦系數(shù)與磨損率,是一種很有發(fā)展?jié)摿Φ谋Ｗo(hù)涂層。DLC膜主要由C、H原子組成,與橡膠的成分相似,因而兩者具有良好的相容性。橡膠密封圈與滾動(dòng)軸承的配合可以有效防止?jié)櫥瑒┑男孤逗突覊m的進(jìn)入,因而被廣泛應(yīng)用于許多科技領(lǐng)域,如航空、航天、汽車等。但是,動(dòng)態(tài)橡膠密封圈在使用過程中常常因摩擦系數(shù)大而嚴(yán)重磨損以致失效。因此,在橡膠上沉積DLC膜層的研究對(duì)于保證工程應(yīng)用和節(jié)約能源具有重要的意義。本文利用四個(gè)勵(lì)磁線圈構(gòu)成閉合場(chǎng)非平衡磁控濺射系統(tǒng),并采用閉合場(chǎng)非平衡磁控濺射(CFUBMS)法在丁腈橡膠上沉積DLC膜。研究CFUBMS法在不同參數(shù)下脈沖偏壓電源的電特性;利用兩個(gè)石墨磁控對(duì)靶進(jìn)行CFUBMS法五因素四水平的正交試驗(yàn),實(shí)驗(yàn)試樣進(jìn)行三次不同的摩擦磨損測(cè)試和微觀結(jié)構(gòu)檢測(cè),分析平均摩擦因數(shù)變化、各因素極差和微觀結(jié)構(gòu)特點(diǎn)。脈沖偏壓電源電特性表明,在CFUBMS(GD)中,隨著勵(lì)磁線圈電流、沉積氣壓和脈沖基底偏壓的增加,基體電流也隨之上升,而隨著C2H2/Ar流量比的增加,基體電流先逐漸升高后又下降;在CFUBMS(DC)中,基體電流隨著勵(lì)磁線圈和石墨磁控靶電流的增加而增加,隨著脈沖基底偏壓的增加先增加后保持不變,而隨著沉積氣壓和C2H2/Ar流量比的增加,基體電流先逐漸升高后又下降,出現(xiàn)下降點(diǎn)的原因?yàn)槠珘弘娫吹倪^流保護(hù)。兩種方法中C2H2/Ar流量比對(duì)基體電流的影響均出現(xiàn)轉(zhuǎn)折點(diǎn),證明該因素在膜層沉積中的重要影響作用。摩擦磨損測(cè)試結(jié)果表明,摩擦加載力和速率增加都會(huì)引起摩擦因數(shù)上升。當(dāng)摩擦加載力增加時(shí),摩擦壓頭壓入較深使滯后性摩擦占主導(dǎo),摩擦因數(shù)會(huì)突變?cè)黾?摩擦速率增加時(shí),粘滯性摩擦占主導(dǎo),摩擦因數(shù)會(huì)隨時(shí)間緩慢上升。對(duì)趨勢(shì)圖和極差圖的分析得出最佳組合:石墨靶電流1.0A,沉積氣壓2Pa,C2H2:Ar=1:3,脈沖偏壓-200V(80%)。對(duì)薄膜摩擦因數(shù)影響程度從大到小依次是C2H2/Ar流量比、石墨靶電流、偏壓占空比、脈沖偏壓大小和沉積氣壓。橡膠上DLC膜的微觀組織結(jié)構(gòu)研究表明,DLC膜的表面一般由網(wǎng)狀結(jié)構(gòu)(與sp3鍵相關(guān))和團(tuán)簇狀結(jié)構(gòu)(與sp2鍵相關(guān))共同組成。DLC膜層厚度較大和sp2鍵含量較高時(shí),摩擦因數(shù)才能維持在較低的水平。
[Abstract]:Due to its high hardness, high chemical corrosion resistance and low friction coefficient and wear rate, the diamond-like carbon film (DLC) is a potential protective coating. DLC film is mainly composed of Con H atoms and is similar to rubber. The combination of rubber sealing ring and rolling bearing can effectively prevent the leakage of lubricant and the entry of dust, so it is widely used in many fields of science and technology, such as aviation, aerospace, automobile, etc. However, The dynamic rubber seal ring is often worn out because of the high friction coefficient in the process of use. The study on the deposition of DLC film on rubber is of great significance for ensuring engineering application and energy saving. In this paper, four excitation coils are used to form a closed field unbalanced magnetron sputtering system. DLC films were deposited on nitrile rubber by closed field unbalanced magnetron sputtering (DLC) method. The electrical characteristics of pulse bias power supply with different parameters by CFUBMS method were studied, and the orthogonal experiments of five factors and four levels of CFUBMS method were carried out on the target by using two graphite magnetron methods. Three times of different friction and wear tests and microstructure tests were carried out to analyze the variation of average friction coefficient, the difference of various factors and the characteristics of microstructure. The electrical characteristics of pulse bias power supply show that, in CFU BMS GD), with the excitation coil current, The substrate current increased with the increase of deposition pressure and pulse substrate bias voltage. With the increase of C _ 2H _ 2 / ar flow ratio, the substrate current increased first and then decreased; in CFU BMS DC, the substrate current increased at first and then decreased with the increase of the flow ratio of C _ 2H _ 2 / ar. The matrix current increases with the increase of excitation coil and graphite magnetron target current, increases firstly with the increase of pulse substrate bias voltage and then remains unchanged. With the increase of deposition pressure and C _ 2H _ 2 / ar flow ratio, the matrix current increases at first and then decreases. In both methods, the influence of C _ 2H _ 2 / ar flux ratio on the substrate current has reached a turning point, which proves that this factor plays an important role in the deposition of the film. The friction and wear test results show that, The friction coefficient increases with the increase of friction loading force and rate. When the friction load force increases, the friction coefficient will suddenly increase and the friction coefficient will suddenly increase when the friction pressure head is pressed deeper, and the viscous friction dominates when the friction rate increases, and the friction coefficient increases with the increase of friction load force, and the friction coefficient increases with the increase of friction load force. The friction coefficient will rise slowly with time. The analysis of the trend chart and the range chart shows that the best combination is: graphite target current 1.0 A, deposition pressure 2PaA C2H 2: Arg 1: 3, pulse bias voltage -200V ~ (80). The influence on the friction coefficient of the film is in the order of C _ 2H _ 2 / ar flow ratio, graphite target current, and so on. Bias duty cycle, Pulse bias and deposition pressure. The microstructure of DLC film on rubber shows that the surface of DLC film is generally composed of reticular structure (related to sp3 bond) and cluster structure (related to sp2 bond). When the content of Daiwa sp2 bond is high, The friction factor can only be maintained at a lower level.
【學(xué)位授予單位】：哈爾濱工業(yè)大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類號(hào)】：TB306;TQ333.7

【參考文獻(xiàn)】

相關(guān)期刊論文 前3條

1 張繼成;吳衛(wèi)東;許華;唐曉紅;;磁控濺射技術(shù)新進(jìn)展及應(yīng)用[J];材料導(dǎo)報(bào);2004年04期

2 牟宗信,李國(guó)卿,黃開玉;同軸磁場(chǎng)對(duì)非平衡磁控濺射系統(tǒng)放電特性的影響[J];核聚變與等離子體物理;2004年02期

3 聶朝胤;張碧云;謝紅梅;;非平衡磁控濺射摻Ti類金剛石薄膜的結(jié)構(gòu)分析[J];金屬學(xué)報(bào);2007年11期

相關(guān)博士學(xué)位論文 前1條

1 韓珩;丁腈橡膠表面化學(xué)改性及其摩擦學(xué)和耐油性能研究[D];沈陽(yáng)工業(yè)大學(xué);2014年

，

本文編號(hào)：1591077